19 March 2018 A tabletop coherent EUV source for commercial EUVL metrology and imaging applications
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Abstract
We present performance characterization for KMLabs’ high harmonic generation (HHG) -based 13.5 nm EUV source, the XUUS4 TM. This source meets critical specifications for metrology and imaging applications, including in its long-term stability, and has been applied to ultrahigh resolution coherent diffractive imaging at 13.5 nm.
Conference Presentation
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Xiaoshi Zhang, Jon Garlick, Eric Mountfort, Henry Kapteyn, "A tabletop coherent EUV source for commercial EUVL metrology and imaging applications", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105831C (19 March 2018); doi: 10.1117/12.2297507; https://doi.org/10.1117/12.2297507
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