19 March 2018 A tabletop coherent EUV source for commercial EUVL metrology and imaging applications
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Abstract
We present performance characterization for KMLabs’ high harmonic generation (HHG) -based 13.5 nm EUV source, the XUUS4 TM. This source meets critical specifications for metrology and imaging applications, including in its long-term stability, and has been applied to ultrahigh resolution coherent diffractive imaging at 13.5 nm.
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Xiaoshi Zhang, Xiaoshi Zhang, Jon Garlick, Jon Garlick, Eric Mountfort, Eric Mountfort, Henry Kapteyn, Henry Kapteyn, } "A tabletop coherent EUV source for commercial EUVL metrology and imaging applications", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105831C (19 March 2018); doi: 10.1117/12.2297507; https://doi.org/10.1117/12.2297507
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