Thermomechanical changes of EUV mask and absorber dependency

Chung-Hyun Ban; Sung-Gyu Lee; Eun-Sang Park; Jae-Hun Park; Hye-Keun Oh

doi:10.1117/12.2299495

22 March 2018 Thermomechanical changes of EUV mask and absorber dependency

Chung-Hyun Ban, Sung-Gyu Lee, Eun-Sang Park, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10583, Extreme Ultraviolet (EUV) Lithography IX; 1058322 (2018) https://doi.org/10.1117/12.2299495
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Thermal and structural deformations of extreme ultraviolet lithography (EUVL) masks during the exposure process may become important issues as these masks are subject to rigorous image placement and flatness change. The reflective masks used for EUVL absorb energy during exposure, and the temperature of the mask rises as a result. This can cause thermomechanical deformation that can reduce the pattern quality. Therefore, it is necessary to predict and optimize the effect of energy transmitted from the extreme ultraviolet (EUV) light source and the resultant patterns of complex multilayer structured EUV masks. Our study shows that temperature accumulation and deformation of the EUV mask are dependent on the absorber structure.

Citation Download Citation

Chung-Hyun Ban, Sung-Gyu Lee, Eun-Sang Park, Jae-Hun Park, and Hye-Keun Oh "Thermomechanical changes of EUV mask and absorber dependency", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 1058322 (22 March 2018); https://doi.org/10.1117/12.2299495

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Extreme ultraviolet

Extreme ultraviolet lithography

Finite element methods

Computer simulations

Multilayers

Image processing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years