19 March 2018 Key components development progress updates of the 250W high-power LPP-EUV light source
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Abstract
Gigaphoton Inc. is developing a laser produced plasma (LPP) extreme ultra violet (EUV) light source for high-volumemanufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO2) laser with 15ns pulse duration, a short wavelength solid-state pre-pulse laser with 10ps pulse duration, a highly stabilized small droplet (DL) target, a precise laser-DL shooting control system and debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.
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Yoshifumi Ueno, Tsukasa Hori, Yasufumi Kawasuji, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saitou, Hakaru Mizoguchi, "Key components development progress updates of the 250W high-power LPP-EUV light source", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 1058328 (19 March 2018); doi: 10.1117/12.2283066; https://doi.org/10.1117/12.2283066
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