19 March 2018 Key components development progress updates of the 250W high-power LPP-EUV light source
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Abstract
Gigaphoton Inc. is developing a laser produced plasma (LPP) extreme ultra violet (EUV) light source for high-volumemanufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO2) laser with 15ns pulse duration, a short wavelength solid-state pre-pulse laser with 10ps pulse duration, a highly stabilized small droplet (DL) target, a precise laser-DL shooting control system and debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshifumi Ueno, Yoshifumi Ueno, Tsukasa Hori, Tsukasa Hori, Yasufumi Kawasuji, Yasufumi Kawasuji, Yutaka Shiraishi, Yutaka Shiraishi, Tatsuya Yanagida, Tatsuya Yanagida, Kenichi Miyao, Kenichi Miyao, Hideyuki Hayashi, Hideyuki Hayashi, Takuya Ishii, Takuya Ishii, Yukio Watanabe, Yukio Watanabe, Takeshi Okamoto, Takeshi Okamoto, Tamotsu Abe, Tamotsu Abe, Takeshi Kodama, Takeshi Kodama, Hiroaki Nakarai, Hiroaki Nakarai, Taku Yamazaki, Taku Yamazaki, Noritoshi Itou, Noritoshi Itou, Takashi Saitou, Takashi Saitou, Hakaru Mizoguchi, Hakaru Mizoguchi, } "Key components development progress updates of the 250W high-power LPP-EUV light source", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 1058328 (19 March 2018); doi: 10.1117/12.2283066; https://doi.org/10.1117/12.2283066
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