Invited Session: Scanning Probe Patterning
Proc. SPIE 10584, High-throughput scanning probe instruments for nanopatterning, alignment, and overlay metrology, 1058404 (19 March 2018); https://doi.org/10.1117/12.2294994
Proc. SPIE 10584, Thermal scanning probe lithography: from spintronics to biomedical applications, 1058405 (19 March 2018); https://doi.org/10.1117/12.2301253
Novel Lithography and Alternative Patterning I
Proc. SPIE 10584, Multi-color approach on self-aligned multiple patterning for single line cut application, 1058408 (6 April 2018); https://doi.org/10.1117/12.2299653
Proc. SPIE 10584, Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications, 1058409 (19 March 2018); https://doi.org/10.1117/12.2297537
Self-Assembly
Proc. SPIE 10584, Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications, 105840C (19 March 2018); https://doi.org/10.1117/12.2297407
Proc. SPIE 10584, Inorganic guiding template implementation for DSA contact hole shrink process (Conference Presentation), 105840D (); https://doi.org/10.1117/12.2297422
E-beam Lithography
Proc. SPIE 10584, e-beam direct write: why it's always left standing at the altar of new nodes, 105840F (19 March 2018); https://doi.org/10.1117/12.2302608
Proc. SPIE 10584, Multi-beam mask writer MBM-1000, 105840H (5 April 2018); https://doi.org/10.1117/12.2299885
DSA Materials and Characterization: Joint session with conferences 10586 and 10584
Proc. SPIE 10584, Block copolymers for sub-10nm directed self-assembly lithography (Conference Presentation), 105840J (); https://doi.org/10.1117/12.2297030
Proc. SPIE 10584, Studying the effects of chemistry and geometry on DSA hole-shrink process in three dimensions, 105840K (19 March 2018); https://doi.org/10.1117/12.2297461
DSA Materials and Integration: Joint session with conferences 10586 and 10584
Proc. SPIE 10584, The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CD, 105840L (28 March 2018); https://doi.org/10.1117/12.2297365
Proc. SPIE 10584, Defect and roughness reduction of chemo-epitaxy DSA pattern, 105840M (19 March 2018); https://doi.org/10.1117/12.2297185
Proc. SPIE 10584, Evaluation of line-edge/line-width roughness of directed self-assembled PS-b-PMMA patterns using coarse-grained molecular dynamics simulation, 105840N (19 March 2018); https://doi.org/10.1117/12.2297485
Proc. SPIE 10584, Manufacturing directed self assembly flows enabled by advanced materials (Conference Presentation), 105840O (); https://doi.org/10.1117/12.2304949
Nanoimprint Lithography Masks and Systems
Proc. SPIE 10584, Fabrication of full-field 1z nm template using multi-beam mask writer (Conference Presentation), 105840P (); https://doi.org/10.1117/12.2299778
Proc. SPIE 10584, Performance of a nanoimprint mask replication system, 105840Q (19 March 2018); https://doi.org/10.1117/12.2299636
Proc. SPIE 10584, Design for nanoimprint lithography: Hot spot modification through total NIL process simulation , 105840R (19 March 2018); https://doi.org/10.1117/12.2297361
Proc. SPIE 10584, A novel resist system for enhanced resist spreading in nanoimprint lithography, 105840S (19 March 2018); https://doi.org/10.1117/12.2299608
Nanoimprint Lithography for High Volume Manufacturing
Proc. SPIE 10584, Updates of nanoimprint lithography for production and applications for next generation memory devices, 105840T (19 March 2018); https://doi.org/10.1117/12.2297274
Proc. SPIE 10584, Overlay improvements using a novel high-order distortion correction system for NIL high-volume manufacturing, 105840U (19 March 2018); https://doi.org/10.1117/12.2299644
Proc. SPIE 10584, Improvement of nano-imprint lithography performance for device fabrication, 105840V (2 May 2018); https://doi.org/10.1117/12.2297294
Novel Lithography and Alternative Patterning II and 3D Patterning Methods
Proc. SPIE 10584, Pattering liquids: A novel approach to integrate functional liquids with solid state devices (Conference Presentation), 105840W (); https://doi.org/10.1117/12.2303585
Proc. SPIE 10584, 3D micro-mirror lithography for mass manufacturing, 105840X (19 March 2018); https://doi.org/10.1117/12.2300951
Proc. SPIE 10584, Electrochemical nanoimprinting of silicon: A direct patterning approach, 105840Y (19 March 2018); https://doi.org/10.1117/12.2297566
Proc. SPIE 10584, AutoSCIL 200mm tooling in production, x-ray optics and cell growth templates, 105840Z (19 March 2018); https://doi.org/10.1117/12.2297445
Novel Lithography and Alternative Patterning III
Proc. SPIE 10584, Process development of a maskless N40 via level for security application with multi-beam lithography, 1058411 (19 March 2018); https://doi.org/10.1117/12.2297162
Proc. SPIE 10584, Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography, 1058412 (19 March 2018); https://doi.org/10.1117/12.2305905
Poster Session
Proc. SPIE 10584, Contact/proximity stepper using UVA, UVB, and UVC light sources, 1058413 (19 March 2018); https://doi.org/10.1117/12.2292953
Proc. SPIE 10584, Green ethanol-developable electron beam lithography processes using positive tone biomass resist material , 1058414 (19 March 2018); https://doi.org/10.1117/12.2295145
Proc. SPIE 10584, Nanoimprint lithography using gas permeable template II, 1058415 (19 March 2018); https://doi.org/10.1117/12.2295147
Proc. SPIE 10584, Gas permeable template derived from cellulose in ultraviolet nanoimprint, 1058416 (19 March 2018); https://doi.org/10.1117/12.2297093
Proc. SPIE 10584, Benchmarking 3-color photoresists for multiphoton absorption lithography, 1058417 (19 March 2018); https://doi.org/10.1117/12.2299318
Proc. SPIE 10584, In situ polymerization threshold detection of 3-color systems and a study of the time dependence, 1058419 (19 March 2018); https://doi.org/10.1117/12.2302807
Proc. SPIE 10584, Substrate damageless tri-layer process for advanced ArFi lithography, 105841B (19 March 2018); https://doi.org/10.1117/12.2297337
Proc. SPIE 10584, Model-based proximity effect correction for helium ion beam lithography, 105841C (19 March 2018); https://doi.org/10.1117/12.2297691
Proc. SPIE 10584, Process control technology for nanoimprint lithography, 105841D (23 March 2018); https://doi.org/10.1117/12.2297332
Proc. SPIE 10584, Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning, 105841E (19 March 2018); https://doi.org/10.1117/12.2302685
Proc. SPIE 10584, Material development for high-throughput nanoimprint lithography, 105841F (21 March 2018); https://doi.org/10.1117/12.2297307
Proc. SPIE 10584, Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching, 105841G (19 March 2018); https://doi.org/10.1117/12.2305268
Proc. SPIE 10584, Effect of homopolymer concentration on LER and LWR in block copolymer/homopolymer blends, 105841H (4 April 2018); https://doi.org/10.1117/12.2318642
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