19 March 2018 Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
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Abstract
Directed Self Assembly (DSA) of block-copolymers (BCPs) is considered as a cost-effective solution to extend the performances of conventional lithography. In this work, we propose a smart surface modification technique to precisely control the surface affinity of guiding template used in the DSA graphoepitaxy process flows. The presented method consists in the UV irradiation of copolymers brushes in order to locally tune their surface affinity. By this way, we are able to differentiate the surface affinities of guide sidewalls (PMMA-attractive) and guide bottom (non-preferential affinity). A complete DSA-module is demonstrated and implemented on a 300mm integration flow dedicated to the creation of silicon nanowires-like transistor.
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P. Pimenta-Barros, G. Claveau, M. Argoud, Z. Chalupa, N. Allouti, C. Comboroure, G. Chamiot-Maitral, N. Posseme, L. Pain, R. Tiron, C. Navarro, C. Nicolet, I. Cayrefourcq, "Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications", Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840C (19 March 2018); doi: 10.1117/12.2297407; https://doi.org/10.1117/12.2297407
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