In this report, we present the latest results regarding the defect reduction and LER improvement work regarding chemoepitaxy line & space pattern. In addition, we update the evaluation results regarding chemo-epitaxy hole pattern.
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Makoto Muramatsu, Takanori Nishi, Gen You, Yasuyuki Ido, Takahiro Kitano, "Defect and roughness reduction of chemo-epitaxy DSA pattern," Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840M (19 March 2018);