19 March 2018 Defect and roughness reduction of chemo-epitaxy DSA pattern
Author Affiliations +
Directed self-assembly (DSA) is one of the candidates for next generation lithography. Over the past years, many papers and presentation have been reported regarding DSA, and Tokyo Electron Limited (TEL is a registered trademark or a trademark of Tokyo Electron Limited in Japan and /or other countries.) also has presented the evaluation results and the advantages of each1-6. Especially, the chemo-epitaxy process has advantages for the sub 20nm line & space patterns to apply to DRAM active area, Logic fin and narrow metal patterns. One of the biggest advantages of DSA lines is that the pattern pitch is decided by the specific factors of the block copolymer, and it achieves the small pitch walking as a consequence. On the other hand, the chemo-epitaxy process can be applied to the hexagonal close-packed arrangement holes6. Those holes are expected to be the patterns for DRAM storage.

In this report, we present the latest results regarding the defect reduction and LER improvement work regarding chemoepitaxy line & space pattern. In addition, we update the evaluation results regarding chemo-epitaxy hole pattern.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Makoto Muramatsu, Makoto Muramatsu, Takanori Nishi, Takanori Nishi, Gen You, Gen You, Yasuyuki Ido, Yasuyuki Ido, Takahiro Kitano, Takahiro Kitano, "Defect and roughness reduction of chemo-epitaxy DSA pattern", Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840M (19 March 2018); doi: 10.1117/12.2297185; https://doi.org/10.1117/12.2297185

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