In this paper, we review the progress and status of the FPA-1100NR2 mask replication system and also discuss the methods used on wafer imprint systems to extend the life of a replica mask. Criteria that are crucial to the success of a replication platform include image placement (IP) accuracy and critical dimension uniformity (CDU). Data is presented on both of these subjects. With respect to image placement, an IP accuracy (after removing correctables) of 0.8nm in X, 1.0nm in Y has been demonstrated. Particle adders were studied by cycling the tool for more than 16000 times and measuring particle adders. Additionally, new methods, including on-tool wafer inspection and in-situ mask cleaning are being studied to further extend the replica mask life.
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Atsushi Kimura, Kohei Imoto, Chiaki Sato, Kiyohito Yamamoto, Hiroshi Inada, Mitsuru Hiura, Takehiko Iwanaga, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones, "Performance of a nanoimprint mask replication system," Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840Q (19 March 2018);