Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography

T. S. Kulmala; C. D. Rawlings; M. Spieser; T. Glinsner; A. Schleunitz; F. Bullerjahn; F. Holzner

doi:10.1117/12.2305905

19 March 2018 Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography

T. S. Kulmala, C. D. Rawlings, M. Spieser, T. Glinsner, A. Schleunitz, F. Bullerjahn, F. Holzner

Author Affiliations +

Proceedings Volume 10584, Novel Patterning Technologies 2018; 1058412 (2018) https://doi.org/10.1117/12.2305905
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Nanoimprint lithography (NIL) is one of the most promising technology platforms for replication of nanometer and micrometer scale 3D topographies with extremely high resolution and throughput, as needed for e.g. photonic or optical applications. One of the remaining challenges of 3D NIL, however, is the fabrication of high quality 3D master originals – the initial patterns that are replicated multiple times in the NIL process. Here, we demonstrate a joint solution for 3D NIL where NanoFrazor thermal scanning probe lithography (t-SPL) is used to pattern the master templates with singlenanometer accurate 3D topographies. 3D topographies from polymer resist master templates are replicated using a HERCULES NIL system with SmartNIL technology. Furthermore, 3D patterns are transferred from the resist into a silicon substrate via reactive ion etching (RIE) and the resulting silicon master template is used for producing polymeric working stamps into OrmoStamp and, finally, replicas into optical grade OrmoClearFX material. Both replication strategies result in very high-quality replicas of the original patterns.

Citation Download Citation

T. S. Kulmala, T. S. Kulmala, C. D. Rawlings, C. D. Rawlings, M. Spieser, M. Spieser, T. Glinsner, T. Glinsner, A. Schleunitz, A. Schleunitz, F. Bullerjahn, F. Bullerjahn, F. Holzner, F. Holzner, "Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography", Proc. SPIE 10584, Novel Patterning Technologies 2018, 1058412 (19 March 2018); doi: 10.1117/12.2305905; https://doi.org/10.1117/12.2305905

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years