19 March 2018 Green ethanol-developable electron beam lithography processes using positive tone biomass resist material
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Abstract
Green ethanol-developable electron beam lithography processes has great potential for reducing toxicity and future production of micro electro mechanical systems (MEMS), imprint molds, and biosensors where continued success ultimately requires improvements in existing electron beam lithography processes. This study presents progress in the development of a new positive tone biomass-based resist material with high hydrophilicity from the viewpoint of utilization of agricultural resources and advanced use of biomass for improving resolution on hardmask middlelayer. The ethanol-developable images of 70 nm line patterns were provided by the green ethanol-developable processes, instead of the common developable processes of tetramethylammonium hydroxide and organic solvents whose ecotoxicity is described by The Globally Harmonized System of Classification and Labelling of Chemicals, GHS.
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Satoshi Takei, "Green ethanol-developable electron beam lithography processes using positive tone biomass resist material ", Proc. SPIE 10584, Novel Patterning Technologies 2018, 1058414 (19 March 2018); doi: 10.1117/12.2295145; https://doi.org/10.1117/12.2295145
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