23 April 2018 Front Matter: Volume 10585
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10585 including the Title Page, Copyright information, Table of Contents, Introduction, and Conference Committee listing.
Ukraintsev and Adan: Front Matter: Volume 10585

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Author(s), “Title of Paper,” in Metrology, Inspection, and Process Control for Microlithography XXXII, edited by Vladimir A. Ukraintsev, Ofer Adan, Proceedings of SPIE Vol. 10585 (SPIE, Bellingham, WA, 2018) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510616622

ISBN: 9781510616639 (electronic)

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Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abad Mayor, Begoña, 0N

Ache, Oliver, 1V

Adams, Daniel E., 0M, 0N, 2O

Agarwal, Shivam, 1B

Aharon, Sharon, 32

Alkemade, Paul, 2D

Ando, Satoshi, 2Z

Anis, Fatima, 1B

Anunciado, Roy, 25

Arat, K. T., 18

Archie, C., 0W

Babin, Sergey, 17, 2B

Baderot, J., 2R

Bal, E., 31

Banke, W., 0W

Bastani, Vahid, 1N

Bäumer, Stefan, 33

Bello, A. F., 0I

Ben-Dov, Guy, 1E, 32

Bernard, G., 2R

Besacier, Maxime, 0F

Bevis, Charles S., 0M, 0N, 2O

Bhattacharyya, Kaustuve, 1F

Bidiuk, Oleksii, 2X

Birnstein, Norman, 1R

Bizen, Daisuke, 1A

Blancquaert, Yoann, 0F

Böcker, Paul, 0V, 1P

Borisov, Sergey, 17, 2B

Bouyssou, Régis, 07

Briginas, I., 0W

Buhl, Stefan, 1H, 1U, 2C, 2T

Bunday, Benjamin, 0I

Calado, Victor, 07

Casselberry, Richard, 1Q

Cekli, Hakki Ergun, 1N

Chai, Yvon, 0V

Chang, Hammer, 1F, 1I

Chang, Jia Hung, 1H, 1R

Chang, Ken, 1F

Chao, Weilun, 0N

Chapon, Jean-Damien, 1C

Charley, Anne-Laure, 0D, 19, 22

Chen, Charlie, 1H, 1R

Chen, Chu-En, 2W

Chen, K. C., 2I

Chen, Kai-Hsiung, 1F

Chen, Ziqi, 2S

Cheng, Kevin, 1F

Cheng, Po-Chung, 2W

Cho, Sang-Joon, 2U

Choi, Ahlin, 1D, 2A, 32

Choi, Dongsub, 1D, 2A

Choi, Sung-Won, 27

Choi, Won-Woong, 1O

Chou, Kevin, 1L, 35

Chouaib, Houssam, 2Y

Chu, Dinh, 1Q

Cohen, B., 31

Constantoudis, Vassilios, 0D, 1K, 1W, 34

Corradi, Antonio, 25

Cramer, Hugo, 1I

Daniel, David, 1U

Dave, Dhara, 0U

de Boer, Guido, 0U

De Caunes, Jean, 1C

de la Fuente, Isabel, 1I

den Boef, Arie, 1F

Dépré, Jérôme, 07

Dervilllé, A., 2R

De Simone, Danilo, 1K

Dettoni, Florent, 07

Dezauzier, Christophe, 07

Dillen, Harm, 1L

Dixit, Dhairya, 1Q

Doi, Ayumi, 17

Donald, Jason, 2X

Dos Santos Ferreira, Olavio, 0T

Dosho, Tomonori, 2Z

Duclaux, Benjamin, 1C

Dutrow, Gavin, 2X

Ebeling, Rob, 2D

Ebersbach, Peter, 14

El Kodadi, Mohamed, 1O, 27

Enomoto, Masashi, 29

Erley, Georg, 1R, 1U

Esashi, Yuka, 0M, 2O

Estrella, Joel, 29

Etzioni, Yoav, 0X

Fang, Fang, 1Q

Fang, Wei, 25, 2Q

Fei, Ray, 2Q

Feng, Mu, 2Q

Fernández Herrero, Analía, 0P

Florijn, Bastiaan, 33

Fonseca, Carlos, 29

Foucher, J., 2R

Fouquet, Christophe, 1F

Frazer, Travis, 0N

Freitag, Martin, 1H

Freychet, Guillaume, 0F, 12

Fuerst, L., 1E

Fukuda, Hiroshi, 0H

Fukuto, M., 12

Gardner, Dennis, 0N

Gatefait, Maxime, 1C

Gergaud, Patrice, 0F

Gerini, Giampiero, 0Q

Gerrity, Michael, 0M

Getin, Raphael, 2A

Goddard, Lynford L., 08

Gogolides, Evangelos, 1K, 1W, 34

Golotsvan, Anna, 0U, 32

Gosali, Benny, 1F

Govindarajulu, Venugopal, 1B

Gronlund, Keith, 2Q

Grouwstra, Cedric, 1O, 27

Grzela, Grzegorz, 0T

Guerrero, James, 2Q

Guhlemann, Steffen, 1U

Guittet, Pierre-Yves, 27

Guo, Yunbo, 2Q

Gutsch, Manuela, 1H, 2C, 2T

Habets, Boris, 1H, 1R, 1U, 2C, 2T

Hagen, C. W., 18

Hajaj, Eitan M., 32

Han, Jin-Hee, 21

Han, Runyuan, 1V

Han, Sangjoon, 1D, 2A, 32

Han, Woojun, 20

Hartig, Carsten, 14, 1E

Hasumi, Kazuhisa, 0B

Haupt, Ronny, 0U, 1E

Heil, Stephan, 1O

Hernandez-Charpak, Jorge N., 0N

Hexemer, A., 12

Hinnen, Paul, 0V, 1L

Hofmann, Detlef, 2C, 2T

Hong, Jong Kyun, 1O

Hong, Minhyung, 1D, 2A, 32

Horiguchi, Naoto, 0B, 0M

Hsu, Hsiao Lin, 1H, 1R

Hsu, Zack, 1I

Hu, C. M., 2I

Hu, Dawei, 2Y

Hu, Xuerang, 1L, 35

Huang, Guo-Tsai, 1F

Huang, Shang-Chieh, 2W

Hunsche, Stefan, 25

Hurley, Jonathan, 0X

Husain, Danish, 0T

Hymes, Diane, 24

Hyun, Min-Sung, 1P

Ikeda, Uki, 1A

Ikota, Masami, 0B, 0D, 0E, 0H, 26

Isbester, Paul, 0X

Ishikawa, Jun, 2Z

Ishimoto, Toru, 0D

Itzkovich, Tal, 0U

Ivonin, I., 2B

Izikson, Pavel, 0T

Jaroslawzew, Sina, 0P

Jayez, David, 1B

Jeon, Sanghuck, 1D, 2A

Jeong, Junhee, 0C

Jiang, Justin, 24

Jo, Ahjin, 2U

Jock, Kevin, 1B

Johnsen, Peter, 0M, 2O

Johnson, Jeff, 1N

Ju, Jae-Wuk, 0V, 1P

Jung, Sang-Hoon, 0V

Kagalwala, Taher, 0X

Kakuta, Junichi, 26

Kameda, Toshimasa, 17

Kang, Charles, 0X

Kang, Yoonshik, 32

Kapteyn, Henry C., 0M, 0N, 2O

Karl, Robert M., Jr., 0M, 0N, 2O

Katnani, A., 0W

Kato, Takashi, 0H

Kawada, Hiroki, 0E, 0H, 26, 2S

Kawano, Hajime, 1A

Kawasaki, Takahiro, 0H, 26

Kazumi, Hideyuki, 2E

Kim, Byong, 2U

Kim, Byoung-Hoon, 27

Kim, Chris, 27

Kim, Hyun-Sok, 0V, 1P

Kim, Hyun-Su, 27

Kim, Jaisoon, 20

Kim, Johan, 1P

Kim, Nakyoon, 1D, 2A

Kim, Sang-Jin, 1O

Kim, Seungyong, 1D, 2A, 32

Kim, Tae-Sun, 27

Kim, Wan-Soo, 2T

Kim, Yong-Chul, 27

Kim, Young-Sik, 0V, 1P, 32

Klein, Dana, 32

Klimpel, T., 18

Kline, R. J., 12

Knobloch, Joshua, 0N

Kobayashi, Shinji, 29

Koek, Wouter, 33

Koh, Kar Kit, 2Q

Kondo, Tsuyoshi, 26

Koshihara, Shunsuke, 0D

Kramer, Esther, 2D

Krause, Gerd, 2C, 2T

Kris, R., 31

Krishnamurthy, Subramanian, 2Q

Kruidhof, Rik, 33

Kubis, Michael, 1L

Kulse, P., 2J

Kumar, D., 12

Kurosawa, Kouichi, 1A

Kwak, Min-Keun, 27

Kwon, Oh-Sung, 1O, 27

Labbaye, Thibault, 0F

Lambregts, Cees, 1P

Landis, Stéfan, 0U

Lang, Jun, 2Q

Laske, Frank, 1V

Laubis, Christian, 0P

Lazkani, Houssam, 0X

Lazzarino, Frederic, 1K

Lee, Chahn, 2E

Lee, Chihoon, 1J

Lee, Dong-jin, 27

Lee, DongYoung, 1D, 2A, 32

Lee, Honggoo, 1D, 2A, 32

Lee, Jeongpyo, 1D

Lee, Jieun, 1D, 2A, 32

Lee, Ji-Hun, 27

Lee, Ju Suk, 2U

Lee, Jun Ho, 0C

Lee, Jun-Hyung, 0V, 1P

Lee, Keibock, 2U

Lee, Sho Shen, 1H, 1R

Lee, Sung-Min, 27

Lee, Yoongi, 20

Le Gratiet, Bertrand, 1C

Leray, P., 19

Levy, S., 31

Li, Daoping, 1I

Liang, Andrew, 24

Liang, Chen-wei, 24

Liang, Jiao, 2Q

Liang, Waley, 1D

Liao, Sax, 1F

Lie, Kenrick, 0T

Likhachev, Dmitriy, 14

Lilach, Saltoun, 32

Lin, Chenxi, 1N

Lin, Chia-Jen, 2W

Lin, Chiawen, 2Q

Lin, John, 1F

Lindenfeld, Z., 1E

Lio, En-Chuan, 1H, 1R

Liu, Gong Cai, 2S

Liu, Haibo, 0X

Liu, Kevin, 1L, 35

Liu, Rex, 1H, 1R

Liu, Xuedong, 1L, 35

Lo, Fred, 2I

Lomtscher, Patrick, 1H, 1R

Lopez-Gomez, Alberto, 2C, 2T

Lorusso, Gian Francesco, 0B, 0D, 19, 1K, 22, 34

Lozenko, S., 1E

Ma, Eric, 1L, 35

Maas, Diederik, 2D

Mack, Chris A., 0D, 1K, 24

Maeng, Kwang-Seok, 1O

Malkova, Natalia, 2Y

Mancini, Giulia, 0N

Mandoy, Ram S., 0T

Mao, Xiaoming, 2S

Marchelli, Anat, 0U

Marciano, Tal, 32

Martinez, S., 2R

Maruyama, Kotaro, 2W

Maslow, Mark, 1L

Massacrier, Clément, 07

Massier, Jennifer, 0V

Matsunobu, Masazumi, 1N

McNamara, Elliott, 0V, 1I, 1P

Meixner, Philipp, 27

Mellegaard, Corey, 1U

Mengel, Markus, 2A

Mentzel, Heiko, 0P

Mi, Jian, 2S

Miceli, Giacomo, 0V

Miley, Galen P., 0M

Milstein, A., 31

Mishra, Shailendra, 1Q

Mizutani, Shunsuke, 1A

Mohtashami, Abbas, 0R

Mokaberi, Babak, 0T

Momonoi, Yoshinori, 0H

Monget, Cédric, 1C

Morita, Masahiro, 2Z

Moussa, Alain, 0D

Mukhtar, Maseeh, 2L

Mulkens, Jan, 1L

Murnane, Margaret M., 0M, 0N, 2O

Nafus, Kathleen, 29

Nakazawa, S., 2B

Naulleau, Patrick, 0D, 12

Niesing, Henk, 1N

Nije, Jelle, 1N

Nooitgedagt, Tjitte, 27

Noot, Marc, 1F

Oh, Eungryong, 1D, 2A, 32

Oh, Hangyeong, 20

Oh, Jonghun, 1O

Oh, Nang-Lyeom, 0V, 1P

Ohashi, Takeyoshi, 0B, 22

Okada, Soichiro, 29

Olvera, Raul, 0T

Overcast, Marshall, 1U

Pain, Laurent, 0U

Pandev, Stilian, 1D

Pandolfi, R., 12

Papavieros, George, 1K, 1W, 34

Park, Chris, 0C

Park, Dong-Kiu, 0V

Park, Gyunam, 0C

Park, Hyowon, 1D

Park, Jin-Tae, 27

Park, Joon-Soo, 27

Park, Sang-il, 2U

Park, Young-Sik, 27

Pavlovsky, V., 0W

Pereira, Silvania F., 2D

Perrier, Robin, 1C

Piras, Daniele, 0R

Porter, Candice, 1Q

Porter, Christina L., 0M, 0N, 2O

Pradelles, Jonathan, 0U

Price, D., 31

Rademaker, Guido, 0U

Rana, N., 0W

Reche, Jérôme, 0F

Reis, Edward, 0X

Ren, Weiming, 1L, 35

Ren, Zhou, 1Q

Rey, Stepháne, 0U

Rio, David, 2Q

Rispens, Gijsbert, 1K

Robinson, John C., 1D, 2A

Roeth, Klaus-Dieter, 1V

Roller, Justin, 2X

Rosenberg, Aaron J., 2Y

Rovira, Pablo, 2A

Ruhm, M., 1E

Rutigliani, Vito, 0D, 1K, 34

Ryu, Sungyoon, 1J

Sadat Gousheh, Reza, 0T

Sadeghian, Hamed, 0O, 0R, 33

Sakai, Kei, 0H

Sakakibara, Makoto, 1A

Salerno, Antonio, 1I

Sasai, K., 2J

Sato, Yoshishige, 2W

Sawamura, Junpei, 2Z

Scholze, Frank, 0P

Schulz, B., 1E

Schulz, K., 2J

Schwarzband, I., 31

Seo, Moo-Young, 0V

Serero, Dan, 32

Shahrjerdy, Mir, 0V

Shamma, Nader, 24

Shapoval, Tetyana, 0U, 1E

Shi, Hong-Fei, 2Q

Shiba, Yuji, 2Z

Shibazaki, Yuichi, 2Z

Shifrin, Michael, 0X, 14

Shim, Kyuchan, 32

Shimura, Satoru, 29

Shin, Jae-Hyung, 1O

Shindo, Hiroyuki, 22

Shkalim, A., 31

Sirard, Stephen, 24

Slachter, Bram, 1L, 25

Slot, Erwin, 0U

Smirnov, V., 0W

Smith, Justin, 0T

Soco, Aileen, 0V

Sohn, Younghoon, 1J

Solecky, Eric, 0I

Soltwisch, Victor, 0P

Somasundaram, Ravin, 1N

Song, Da, 1Q

Sonntag, Dag, 1N

Spruit, Helma, 2D

Staacks, D., 12

Steigerwald, Hendrik, 1V

Stoevelaar, L. Pjotr, 0Q

Strzalka, J., 12

Su, Eason, 1F

Subramony, Venky, 1N

Sunday, D., 12

Susanto, William, 1N

Sutani, Takumichi, 0D, 19

Suzuki, Makoto, 17, 1A

Tabery, Cyrus, 1N

Tai, Alan, 1I

Takahashi, Satoru, 0E

Takamasu, Kiyoshi, 0E

Takemasa, Yoshikata, 19, 22

Tamer, M. S., 0O

Tan, Zhengquan, 2Y

Tang, Peng, 25

Tanksalvala, Michael, 0M, 0N, 2O

Tarabrin, Sergey, 07

Tel, Wim, 1L, 1P

Teng, Chia-Hao, 2W

Teuwen, Rachel, 0T

Thiel, Bradley, 2L

Thrun, Xaver, 1U, 2C, 2T

Tien, Hung Yu, 25

Tijiwa-Birk, Felipe, 1B

Timoney, Pádraig, 0X, 1Q

Tottewitz, Steven, 1R, 1U

Tu, Li Ming, 2S

Ugurlu, Ozan, 2X

Ukraintsev, V., 0W

Ullah, Zakir, 1N

Urbanowicz, Adam M., 14

Vaid, Alok, 0I, 0W, 1Q

van der Donck, Jacques, 2D

van der Meijden, Vidar, 1O, 27

van der Walle, Peter, 2D

van Es, Maarten H., 0R

van Haren, Richard, 07

van Ingen Schenau, Koen, 25

van Lans, M. J., 0O

van Leest, Arno, 0V

van Oosten, Anton, 25

van Rhee, Peter, 1P

van Roey, Frieda, 0D, 34

Verechagin, V., 31

Verheijen, Martin, 2X

Vinslava, Alina, 1Q

Visser, Bart, 0T

Wallow, Tom, 2Q

Wang, Alvin, 2Q

Wang, Bin, 2O

Wang, Cathy, 1F

Wang, ChangAn, 2Q

Wang, Fei, 1L, 2Q, 35

Wang, Fuming, 25

Wang, Jazer, 2Q

Wang, Jen-Shiang, 2Q

Wang, Lei, 2Q

Wang, Lester, 2Q

Wang, R., 1E

Wang, Yongjun, 25

Warrick, Scott, 1T

Wei, Junwei, 25

Weintraub, Jeffrey, 1T

Wieland, Marco, 0U

Wietstruck, M., 2J

Wise, Rich, 24

Won, Sung-Keun, 1O

Wong, Patrick, 25

Yahiro, Takehisa, 2Z

Yamaguchi, Atsuko, 0B

Yamaguchi, Satoru, 0H

Yamazaki, Yuichiro, 2B, 2W

Yang, Elvis, 2I

Yang, Hong-Cheon, 27

Yang, Liu, 24

Yang, Sunseok, 20

Yang, T. H., 2I

Yang, Yusin, 1J

Yellai, Naren, 0X

Yokosuka, Toshiyuki, 2E

Yoo, Sungchul, 2A

Yoo, Young-kook, 2U

Ypma, Alexander, 1N

Yu, Jengyi, 24

Zagorodnev, G., 0W

Zandiatashbar, Ardavan, 2U

Zhang, Chen, 2Q

Zhang, Dong Qing, 2Q

Zhang, Hongxin, 2Q

Zhang, Linmiao, 1N

Zhang, Qiang, 2Q

Zhang, Xiaoshi, 0M

Zhang, Zhen, 1B

Zhao, Qian, 2Q

Zhong, Zhenxin, 2X

Zhou, Steve, 0T

Zhou, Yue, 1B

Zhu, Jinlong, 08

Zou, Yi, 1N

Conference Committee

Symposium Chair

  • Bruce W. Smith, Rochester Institute of Technology (United States)

Symposium Co-chair

  • Will Conley, Cymer, An ASML company (United States)

Conference Chair

  • Vladimir A. Ukraintsev, Qorvo™ (United States)

Conference Co-chair

  • Ofer Adan, Applied Materials Ltd. Israel (Israel)

Conference Program Committee

  • John A. Allgair, BRIDG (United States)

  • Masafumi Asano, Tokyo Electron Ltd. (Japan)

  • Benjamin D. Bunday, GLOBALFOUNDRIES Inc. (United States)

  • Jason P. Cain, Advanced Micro Devices, Inc. (United States)

  • Hugo Cramer, ASML Netherlands B.V. (Netherlands)

  • Timothy F. Crimmins, Intel Corporation (United States)

  • Daniel J. C. Herr, The University of North Carolina at Greensboro (United States)

  • Chih-Ming Ke, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

  • Shunsuke Koshihara, Hitachi High-Technologies Corporation (Japan)

  • Yi-Sha Ku, Industrial Technology Research Institute (Taiwan)

  • Byoung-Ho Lee, SK hynix, Inc. (Korea, Republic of)

  • Narender Rana, Western Digital Corporation (United States)

  • Christopher J. Raymond, Nanometrics Inc. (United States)

  • John C. Robinson, KLA-Tencor Corporation (United States)

  • Martha I. Sanchez, IBM Research - Almaden (United States)

  • Matthew J. Sendelbach, Nova Measuring Instruments Inc. (United States)

  • Richard Silver, National Institute of Standards and Technology (United States)

  • Eric Solecky, GLOBALFOUNDRIES Inc. (United States)

  • Alexander Starikov, I&I Consulting (United States)

  • Alok Vaid, GLOBALFOUNDRIES Inc. (United States)

Session Chairs

  • 1 Keynote Session

    Vladimir A. Ukraintsev, Qorvo™ (United States)

    Ofer Adan, Applied Materials Ltd. Israel (Israel)

  • 2 Optical Metrology

    Matthew J. Sendelbach, Nova Measuring Instruments Inc. (United States)

    Hugo Cramer, ASML Netherlands B.V. (Netherlands)

  • 3 Inspection

    Timothy F. Crimmins, Intel Corporation (United States)

    Byoung-Ho Lee, SK hynix Inc. (Korea, Republic of)

  • 4 LWR

    Shunsuke Koshihara, Hitachi High-Technologies Corporation (Japan)

    Christopher J. Raymond, Nanometrics Inc. (United States)

  • 5 Challenges and New Methods

    John C. Robinson, KLA-Tencor Corporation (United States)

    Eric Solecky, GLOBALFOUNDRIES Inc. (United States)

  • 6 New Methods: Student Session

    Alok Vaid, GLOBALFOUNDRIES Inc. (United States)

    Christopher J. Raymond, Nanometrics Inc. (United States)

  • 7 Overlay News

    Alexander Starikov, I&I Consulting (United States)

    Narender Rana, Western Digital Corporation (United States)

  • 8 Hybrid Metrology and Machine Learning

    Narender Rana, Western Digital Corporation (United States)

    Benjamin D. Bunday, GLOBALFOUNDRIES Inc. (United States)

  • 9 New Methods and Machine Learning

    Benjamin D. Bunday, GLOBALFOUNDRIES Inc. (United States)

    Shunsuke Koshihara, Hitachi High-Technologies Corporation (Japan)

  • 10 SEM

    Eric Solecky, GLOBALFOUNDRIES Inc. (United States)

    Martha I. Sanchez, IBM Research - Almaden (United States)

  • 11 Overlay

    Hugo Cramer, ASML Netherlands B.V. (Netherlands)

    Matthew J. Sendelbach, Nova Measuring Instruments Inc. (United States)

  • 12 Design Interactions: Joint session with conferences 10585 and 10588

    John C. Robinson, KLA-Tencor Corporation (United States)

    Ryoung-Han Kim, imec (Belgium)

  • 13 Process Control News

    Alexander Starikov, I&I Consulting (United States)

    Timothy F. Crimmins, Intel Corporation (United States)

  • 14 Process Control

    Masafumi Asano, Tokyo Electron Ltd. (Japan)

    Alexander Starikov, I&I Consulting (United States)

  • 15 Late Breaking News

    Ofer Adan, Applied Materials Ltd. Israel (Israel)

    Vladimir A. Ukraintsev, Qorvo™ (United States)

© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10585", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 1058501 (23 April 2018); doi: 10.1117/12.2323955; https://doi.org/10.1117/12.2323955
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