13 March 2018 Study of μDBO overlay target size reduction for application broadening
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Abstract
With these proceedings we present μ-diffraction-based overlay (μDBO) targets that are well below the currently supported minimum size of 10×10 μm2 . We have been capable of measuring overlay targets as small as 4×4 μm2 with our latest generation YieldStar system. Furthermore we find an excellent precision (TMU < 0.33 nm for 6 × 6 μm2 ) without any compromise on throughput (MAM time < 60 ms). At last a study that compares four generations of YieldStar systems show clearly that the latest generation YieldStar systems is much better capable of reading small overlay targets such that the performance of a 16 × 16 μm2 on an early generation YieldStar 2nd-gen is comparable to that of a 8 × 8 μm2 on the latest YieldStar 5th-gen. This work enables a smaller metrology footprint, more placement flexibility and in-die overlay metrology solutions.
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Victor Calado, Victor Calado, Jérôme Dépré, Jérôme Dépré, Clément Massacrier, Clément Massacrier, Sergey Tarabrin, Sergey Tarabrin, Richard van Haren, Richard van Haren, Florent Dettoni, Florent Dettoni, Régis Bouyssou, Régis Bouyssou, Christophe Dezauzier, Christophe Dezauzier, } "Study of μDBO overlay target size reduction for application broadening", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 1058507 (13 March 2018); doi: 10.1117/12.2297673; https://doi.org/10.1117/12.2297673
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