Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment

Dong-Kiu Park; Hyun-Sok Kim; Moo-Young Seo; Jae-Wuk Ju; Young-Sik Kim; Mir Shahrjerdy; Arno van Leest; Aileen Soco; Giacomo Miceli; Jennifer Massier; Elliott McNamara; Paul Hinnen; Paul Böcker; Nang-Lyeom Oh; Sang-Hoon Jung; Yvon Chai; Jun-Hyung Lee

doi:10.1117/12.2297094

13 March 2018 Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment

Dong-Kiu Park, Hyun-Sok Kim, Moo-Young Seo, Jae-Wuk Ju, Young-Sik Kim, Mir Shahrjerdy, Arno van Leest, Aileen Soco, Giacomo Miceli, Jennifer Massier, Elliott McNamara, Paul Hinnen, Paul Böcker, Nang-Lyeom Oh, Sang-Hoon Jung, Yvon Chai, Jun-Hyung Lee

Author Affiliations +

Proceedings Volume 10585, Metrology, Inspection, and Process Control for Microlithography XXXII; 105850V (2018) https://doi.org/10.1117/12.2297094
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

This paper demonstrates the improvement using the YieldStar S-1250D small spot, high-NA, after-etch overlay in-device measurements in a DRAM HVM environment. It will be demonstrated that In-device metrology (IDM) captures after-etch device fingerprints more accurately compared to the industry-standard CDSEM. Also, IDM measurements (acquiring both CD and overlay) can be executed significantly faster increasing the wafer sampling density that is possible within a realistic metrology budget. The improvements to both speed and accuracy open the possibility of extended modeling and correction capabilities for control. The proof-book data of this paper shows a 36% improvement of device overlay after switching to control in a DRAM HVM environment using indevice metrology.

Conference Presentation

Citation Download Citation

Dong-Kiu Park, Hyun-Sok Kim, Moo-Young Seo, Jae-Wuk Ju, Young-Sik Kim, Mir Shahrjerdy, Arno van Leest, Aileen Soco, Giacomo Miceli, Jennifer Massier, Elliott McNamara, Paul Hinnen, Paul Böcker, Nang-Lyeom Oh, Sang-Hoon Jung, Yvon Chai, and Jun-Hyung Lee "Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105850V (13 March 2018); https://doi.org/10.1117/12.2297094

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