13 March 2018 Scanner focus metrology and control system for advanced 10nm logic node
Author Affiliations +
Immersion lithography is being extended beyond the 10-nm node and the lithography performance requirement needs to be tightened further to ensure good yield. Amongst others, good on-product focus control with accurate and dense metrology measurements is essential to enable this. In this paper, we will present new solutions that enable onproduct focus monitoring and control (mean and uniformity) suitable for high volume manufacturing environment. We will introduce the concept of pure focus and its role in focus control through the imaging optimizer scanner correction interface. The results will show that the focus uniformity can be improved by up to 25%.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junghun Oh, Junghun Oh, Kwang-Seok Maeng , Kwang-Seok Maeng , Jae-Hyung Shin, Jae-Hyung Shin, Won-Woong Choi, Won-Woong Choi, Sung-Keun Won, Sung-Keun Won, Cedric Grouwstra, Cedric Grouwstra, Mohamed El Kodadi, Mohamed El Kodadi, Stephan Heil, Stephan Heil, Vidar van der Meijden, Vidar van der Meijden, Jong Kyun Hong , Jong Kyun Hong , Sang-Jin Kim, Sang-Jin Kim, Oh-Sung Kwon, Oh-Sung Kwon, } "Scanner focus metrology and control system for advanced 10nm logic node", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105851O (13 March 2018); doi: 10.1117/12.2297442; https://doi.org/10.1117/12.2297442

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