13 March 2018 Allowable SEM noise for unbiased LER measurement
Author Affiliations +
Abstract
Recently, a novel method for the calculation of unbiased Line Edge Roughness based on Power Spectral Density analysis has been proposed. In this paper first an alternative method is discussed and investigated, utilizing the Height-Height Correlation Function (HHCF) of edges. The HHCF-based method enables the unbiased determination of the whole triplet of LER parameters including besides rms the correlation length and roughness exponent. The key of both methods is the sensitivity of PSD and HHCF on noise at high frequencies and short distance respectively. Secondly, we elaborate a testbed of synthesized SEM images with controlled LER and noise to justify the effectiveness of the proposed unbiased methods. Our main objective is to find out the boundaries of the method in respect to noise levels and roughness characteristics, for which the method remains reliable, i.e the maximum amount of noise allowed, for which the output results cope with the controllable known inputs. At the same time, we will also set the extremes of roughness parameters for which the methods hold their accuracy.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
George Papavieros, George Papavieros, Vassilios Constantoudis, Vassilios Constantoudis, Evangelos Gogolides, Evangelos Gogolides, } "Allowable SEM noise for unbiased LER measurement", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105851W (13 March 2018); doi: 10.1117/12.2306509; https://doi.org/10.1117/12.2306509
PROCEEDINGS
10 PAGES


SHARE
Back to Top