13 March 2018 Feed-forward alignment correction for advanced overlay process control using a standalone alignment station "Litho Booster"
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Abstract
One of the main components of an On-Product Overlay (OPO) error budget is the process induced wafer error. This necessitates wafer-to-wafer correction in order to optimize overlay accuracy. This paper introduces the Litho Booster (LB), standalone alignment station as a solution to improving OPO. LB can execute high speed alignment measurements without throughput (THP) loss. LB can be installed in any lithography process control loop as a metrology tool, and is then able to provide feed-forward (FF) corrections to the scanners. In this paper, the detailed LB design is described and basic LB performance and OPO improvement is demonstrated. Litho Booster’s extendibility and applicability as a solution for next generation manufacturing accuracy and productivity challenges are also outlined
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Takehisa Yahiro, Takehisa Yahiro, Junpei Sawamura, Junpei Sawamura, Tomonori Dosho, Tomonori Dosho, Yuji Shiba, Yuji Shiba, Satoshi Ando, Satoshi Ando, Jun Ishikawa, Jun Ishikawa, Masahiro Morita, Masahiro Morita, Yuichi Shibazaki, Yuichi Shibazaki, } "Feed-forward alignment correction for advanced overlay process control using a standalone alignment station "Litho Booster"", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105852Z (13 March 2018); doi: 10.1117/12.2297300; https://doi.org/10.1117/12.2297300
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