13 March 2018 Accuracy optimization with wavelength tunability in overlay imaging technology
Author Affiliations +
As semiconductor manufacturing technology progresses and the dimensions of integrated circuit elements shrink, overlay budget is accordingly being reduced. Overlay budget closely approaches the scale of measurement inaccuracies due to both optical imperfections of the measurement system and the interaction of light with geometrical asymmetries of the measured targets. Measurement inaccuracies can no longer be ignored due to their significant effect on the resulting device yield. In this paper we investigate a new approach for imaging based overlay (IBO) measurements by optimizing accuracy rather than contrast precision, including its effect over the total target performance, using wavelength tunable overlay imaging metrology. We present new accuracy metrics based on theoretical development and present their quality in identifying the measurement accuracy when compared to CD-SEM overlay measurements. The paper presents the theoretical considerations and simulation work, as well as measurement data, for which tunability combined with the new accuracy metrics is shown to improve accuracy performance.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Honggoo Lee, Honggoo Lee, Yoonshik Kang, Yoonshik Kang, Sangjoon Han, Sangjoon Han, Kyuchan Shim, Kyuchan Shim, Minhyung Hong, Minhyung Hong, Seungyoung Kim, Seungyoung Kim, Jieun Lee, Jieun Lee, Dongyoung Lee, Dongyoung Lee, Eungryong Oh, Eungryong Oh, Ahlin Choi, Ahlin Choi, Youngsik Kim, Youngsik Kim, Tal Marciano, Tal Marciano, Dana Klein, Dana Klein, Eitan M. Hajaj, Eitan M. Hajaj, Sharon Aharon , Sharon Aharon , Guy Ben-Dov , Guy Ben-Dov , Saltoun Lilach, Saltoun Lilach, Dan Serero, Dan Serero, Anna Golotsvan, Anna Golotsvan, "Accuracy optimization with wavelength tunability in overlay imaging technology", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 1058532 (13 March 2018); doi: 10.1117/12.2300153; https://doi.org/10.1117/12.2300153

Back to Top