27 March 2018 EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system
Author Affiliations +
Abstract
Photosensitized Chemically Amplified ResistTM (PSCARTM) **2.0’s advantages and expectations are reviewed in this paper. Alpha PSCAR in-line UV exposure system (“Litho Enhancer”) was newly installed at imec in a Tokyo Electron Ltd. (TELTM)’s CLEAN TRACKTM LITHIUS ProTM Z connected to an ASML’s NXE:3300. Using the Litho Enhancer, PSCAR 2.0 sensitization preliminary results show that suppression of roughness enhancement may occur while sensitivity is increased. The calibrated PSCAR 2.0 simulator is used for prediction of resist formulation and process optimization. The simulation predicts that resist contrast enhancement could be realized by resist formulation and process optimization with UV flood exposure.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seiji Nagahara, Seiji Nagahara, Michael Carcasi, Michael Carcasi, Gosuke Shiraishi, Gosuke Shiraishi, Yuya Kamei, Yuya Kamei, Kathleen Nafus, Kathleen Nafus, Yukie Minekawa, Yukie Minekawa, Hiroyuki Ide, Hiroyuki Ide, Yoshihiro Kondo, Yoshihiro Kondo, Takahiro Shiozawa, Takahiro Shiozawa, Keisuke Yoshida, Keisuke Yoshida, Masashi Enomoto, Masashi Enomoto, Kosuke Yoshihara, Kosuke Yoshihara, Hideo Nakashima, Hideo Nakashima, Serge Biesemans, Serge Biesemans, Ryo Shimada, Ryo Shimada, Masaru Tomono, Masaru Tomono, Kazuhiro Takeshita, Kazuhiro Takeshita, Teruhiko Moriya, Teruhiko Moriya, Hayakawa Makoto, Hayakawa Makoto, Ryo Aizawa, Ryo Aizawa, Yoshitaka Konishi, Yoshitaka Konishi, Masafumi Hori, Masafumi Hori, Ken Maruyama, Ken Maruyama, Hisashi Nakagawa, Hisashi Nakagawa, Masayuki Miyake, Masayuki Miyake, Tomoki Nagai, Tomoki Nagai, Satoshi Dei, Satoshi Dei, Takehiko Naruoka, Takehiko Naruoka, Motoyuki Shima, Motoyuki Shima, Toru Kimura, Toru Kimura, Geert Vandenberghe, Geert Vandenberghe, John S. Petersen, John S. Petersen, Danilo De Simone, Danilo De Simone, Foubert Philippe, Foubert Philippe, Hans-Jürgen Stock, Hans-Jürgen Stock, Balint Meliorisz, Balint Meliorisz, Akihiro Oshima, Akihiro Oshima, Seiichi Tagawa, Seiichi Tagawa, } "EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 1058606 (27 March 2018); doi: 10.1117/12.2297498; https://doi.org/10.1117/12.2297498
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