13 March 2018 Characterization of metal resist for EUV lithography using Infrared free electron laser
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Abstract
We characterized the reactivity of a model metal resist for extreme ultraviolet (EUV) lithography by using a midInfrared free electron laser (mid-IR FEL). The evaluated metal resist consisted of a zirconium-oxide core and methacrylic-acid (MAA) ligands. The mid-IR spectra of the metal resist were measured to study photoresponse to FEL irradiation. In the spectra, the metal resist exposed with EUV light showed decreases of peaks of MAAs coordinating a metal core and new peaks have emerged. Mid-IR FEL study suggested that the EUV exposure made ligands of the metal resist more reactive, which are possible pointers increasing the sensitivity of the metal resist.
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Minoru Toriumi, Minoru Toriumi, Takayasu Kawasaki, Takayasu Kawasaki, Takayuki Imai, Takayuki Imai, Koichi Tsukiyama, Koichi Tsukiyama, Julius Joseph Santillan, Julius Joseph Santillan, Toshiro Itani, Toshiro Itani, "Characterization of metal resist for EUV lithography using Infrared free electron laser", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105860E (13 March 2018); doi: 10.1117/12.2297156; https://doi.org/10.1117/12.2297156
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