19 March 2018 Automated lamellar block copolymer process characterization
Author Affiliations +
Lamellar CD-SEM image analysis is one of the key step for the development of new polymer formulations. We present in this paper a new approach for the analysis of lamellar CD-SEM that can be extended to any type of other pattern (contact…) with a machine learning approach. We will also focus on the roughness analysis and specifically the Line Edge Roughness (LER) and Power Spectral Density (PSD) with a robust estimation that takes into account curvature of the line. The last part is dedicated to the introduction of a process optimisation technique using machine learning to optimize process parameters from a first design of experiment.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Bernard, G. Bernard, X. Chevalier, X. Chevalier, A. Dervilllé, A. Dervilllé, J. Foucher, J. Foucher, } "Automated lamellar block copolymer process characterization ", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105860Z (19 March 2018); doi: 10.1117/12.2297347; https://doi.org/10.1117/12.2297347

Back to Top