13 March 2018 Application specific ratings of filters for negative-tone developer
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Negative tone development is being employed widely because of its superior resolution. Pall is developing filtration products specially targeted for these high resolution applications. High particle retention and low extractables are key aspects of filtration products known to improve on-wafer defectivity. In the current study, we have found that filtration efficiency of the various filter types towards palladium-heptylamine nanoparticles correlates strongly to actual particle removal determined by on-wafer inspection metrology. Furthermore, using the afore mentioned nanoparticle testing metrology, high retention membranes with low extractables were selected. Particle challenge testing is much simpler than on-wafer defectivity inspection and enables faster and effective filtration membrane selection. Based on these results, the selected filtration membrane is expected to perform effective real particle removal in negative tone developer.
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Toru Umeda, Toru Umeda, Yukihisa Kawada, Yukihisa Kawada, Kazushi Masuda, Kazushi Masuda, Naoya Iguchi, Naoya Iguchi, Tetsuya Murakami, Tetsuya Murakami, Shuichi Tsuzuki, Shuichi Tsuzuki, "Application specific ratings of filters for negative-tone developer", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 1058616 (13 March 2018); doi: 10.1117/12.2297164; https://doi.org/10.1117/12.2297164


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