13 March 2018 The intrinsic role of membrane morphology to reduce defectivity in advanced photochemicals
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Defect source reduction in leading-edge iArF resists is a critical requirement to improve device performance and overall yield in lithography manufacturing processes. It is believed that some polar polymers can aggregate and be responsible for single or multiple micro-bridge defects. Further investigation into the formation of these defects is needed. We have previously presented the effective removal of gel-like polymers using nylon media [1]. However, as the industry is moving to smaller feature sizes, there is a need to further improve the defect removal efficiency. In this paper, a filter, comprised of a novel membrane called Azora with unique morphology and high flow performance is introduced. This new filter shows better on-wafer in an advanced ArF solution than conventional Nylon and UPE media. In addition, it shows improved stability during chemical storage. Results and possible retention mechanisms are discussed.
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Tetsu Kohyama, Tetsu Kohyama, Aiwen Wu, Aiwen Wu, Kozue Miura, Kozue Miura, Yasushi Ohyashiki, Yasushi Ohyashiki, } "The intrinsic role of membrane morphology to reduce defectivity in advanced photochemicals", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 1058617 (13 March 2018); doi: 10.1117/12.2297389; https://doi.org/10.1117/12.2297389


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