13 March 2018 Improved airborne molecular contaminant filter performance for photolithography
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Abstract
Airborne molecular contaminants continue to pose cost of ownership challenges in photolithography. Recent advances in understanding siloxane removal have led to the development of an innovative filtration configuration utilizing new media that works in concert to increase overall filter life for acids, bases and silicon containing organic contaminants. This paper examines accelerated testing results, for these state-of-the-art filtration assemblies versus legacy products, to demonstrate improved system performance. The state-of-the-art filtration assemblies have been evaluated in production semiconductor fabs and have shown favorable performance.
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Gerald Weineck, Gerald Weineck, Brian Hoang, Brian Hoang, Joshua Lais, Joshua Lais, } "Improved airborne molecular contaminant filter performance for photolithography", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105861A (13 March 2018); doi: 10.1117/12.2297034; https://doi.org/10.1117/12.2297034
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