27 March 2018 Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)
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Abstract
This paper describes the photoreactivity of six organometallic complexes of the type PhnMX2 containing bismuth, antimony and tellurium, where n = 3 for bismuth and antimony and n = 2 for tellurium, and where X = acetate (O2CCH3) or pivalate (O2CC(CH3)3). These compounds were exposed to EUV light to monitor photodecomposition via in situ mass spectral analysis of the primary outgassing products of CO2, benzene and phenol. This paper explores the effect of metal center and carboxylate ligand on the EUV reactivity of these EUV photoresists.
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Jacob Sitterly, Jacob Sitterly, Michael Murphy, Michael Murphy, Steven Grzeskowiak, Steven Grzeskowiak, Greg Denbeaux, Greg Denbeaux, Robert L. Brainard, Robert L. Brainard, "Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105861P (27 March 2018); doi: 10.1117/12.2316333; https://doi.org/10.1117/12.2316333
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