14 May 2018 Front Matter: Volume 10587
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10587, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.

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Author(s), “Title of Paper,” in Optical Microlithography XXXI, edited by Jongwook Kye, Soichi Owa, Proceedings of SPIE Vol. 10587 (SPIE, Bellingham, WA, 2018) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510616660

ISBN: 9781510616677 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Author Index

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Aarts, Igor, 0C

Abe, Kunihiko, 12

Alagna, Paolo, 05

Asayama, Takeshi, 1J

Aung, Nyan, 0A

Baron, Stanislas, 0N

Beckers, Marcel, 09

Benichou, Emmanuel, 0S

Beral, Christophe, 04

Berthier, Ludovic, 0T

Besacier, Maxime, 0T

Bhattacharyya, Kaustuve, 0B

Bidault, Laurent, 0T

Biesemans, Serge, 05

Bitensky, Alla, 0F

Bouma, Anita, 1G

Braam, Kyle, 0M

Brevet, Pierre-François, 0S

Brinkhof, Ralph, 0C

Brown, Darius, 0A

Bu, Yang, 1K

Bushida, Satoru, 10, 1J

Cai, Howard, 0M

Cai, Lynn Y., 0R

Caillau, Mathieu, 0S

Cao, Yu, 0N

Cerbu, Florin, 04

Chae, Gyu-Yeol, 0L

Chen, Ao, 08, 0J

Chen, Been-Der, 0N

Chen, Chun-Kuang, 09

Chen, Hsiao-Lan, 09

Chen, K.C., 1L

Chen, L. J., 09

Chen, Miao-Chi, 09

Chen, Yen-Jen, 0A

Chen, Zheng, 08

Cheng, Kevin, 09

Chevalier, Céline, 0S

Chevolot, Yann, 0S

Choi, Heon, 0O

Chung, Woong Jae, 0A

Conklin, David, 1I

Conley, Will, 05

Crémillieu, Pierre, 0S

Delair, Thierry, 0S

de Loijer, Peter, 1G

Demand, Marc, 04

Deng, Yunfei, 0Q

Deng, ZeXi, 15

de Ruiter, Chris, 0C

Djordjevic Kaufmann, Marija, 0F

Domnenko, Vitaly, 0M

Dong, Lisong, 19

Dosho, Tomonori, 0X

Du, Yaojun, 0Q

Duan, Can, 18

Duan, Lifeng, 1K

Ducoté, Julien, 0T

El Kodadi, Mohamed, 0B

Elsaid, Ahmad, 0N

Feng, Yaobin, 0G

Fong, Weichun, 0N

Fonseca, Carlos, 04

Foong, Yee Mei, 0J

Frolov, Dmitry N., 1E

Frolov, Vladimir N., 1E

Fujimaki, Yousuke, 1J

Furusato, Hiroshi, 10

Gao, Haiyong, 0A

Gao, Jin-Wei, 0N

Gao, Wenle, 0A

Geh, Bernd, 0F

Gomez, Juan Manuel, 0A

Goosen, Maikel, 1G

Grahmann, Jan, 03

Granik, Yuri, 0I

Guo, Longxia, 0G

Guo, Moran, 0G

Gupta, Rachit, 0G

Gutjahr, Karsten, 0A

Hamouda, Ayman, 0O

Han, Geng, 08

Han, Hwansoo, 0P

Han, JiWan, 0I

Hany, Sherif, 0K

Hao, Xueli, 0A

Hayakawa, Akira, 0X

He, Guanchen, 0A

He, Jianfang, 19

He, Jun, 0G

Hermans, Jan, 0C

Hikida, Yujiro, 0X

Ho, Chi-Chien, 18

Hong, Jisuk, 0P

Hong, Le, 0L, 1H

Hoppe, Wolfgang, 0M

Horiuchi, Toshiyuki, 1M

Howell, Rafael, 0G, 0N

Hsieh, Michael, 0A

Hsu, Stephen, 0G, 0N

Hu, Che-Ming, 1L

Huang, Jiun-Woei, 0Z, 17, 1D

Hung, Chia-Wei, 09

Hwang, Chan, 0B

Igarashi, Miwa, 1J

Igarashi, Yutaka, 12

Ishida, Keisuke, 10

Islam, Tafsirul, 1I

Itou, Takashi, 1J

Jain, Nikhil, 0J

Jamin-Mornet, Clémence, 0T

Jayaram, Srividya, 0L

Jee, Tae Kwon, 04

Jessen, Scott, 18

Jia, Ning-ning, 0G

Jiang, Fan, 1H

Jin, YaDong, 15

Jock, Kevin, 0A

Jonin, Christian, 0S

Jordan, Levi, 12

Jung, Boram, 0K

Kachwala, Nishrin, 0N

Kallingal, Chidam, 0N

Karssemeijer, Leendertjan, 0C

Kasai, Noriaki, 0X

Kiers, Ton, 04

Kikuchi, Satoru, 12

Kim, Juhwan, 0K, 0L

Kim, Sangwook, 0P

Kim, Soohong, 0R

Kirner, Raoul, 0W, 1F

Kobayashi, Noa, 1M

Kobelkov, Sergey, 0I

Krishnamurthy, Subramanian, 0D

Krumanocker, Ian, 0A

Kuechler, Bernd, 0M

Kumar, Kaushik, 04

Kumazaki, Takahito, 1J

Kurosu, Akihiko, 10, 1J

Lakcher, Amine, 0T

Lammers, Niels, 09

Lan, Song, 0H

Laurenceau, Emmanuelle, 0S

Leclercq, Jean-Louis, 0S

Lee, Heejun, 0P

Lee, Jeong-Woo, 0L

Lee, Jonathan, 0C

Lee, Seung Yoon, 0B

Lee, Sooryong, 0P

Le-Gratiet, Bertrand, 0T

Leisching, Patrick, 0W, 1F

Leray, Philippe, 0C

Leuschel, Benjamin, 0S

Levasier, Leon, 09

Li, Chung-Tien, 0C

Li, Jiangwei, 0H

Li, Li, 1I

Li, Liang, 0Q

Li, Sikun, 1K

Li, Zero, 0G, 0N

Liebregts, Wendy, 1G

Lin, Cheng-Huei, 1L

Lin, John, 09

Liu, Jingjing, 0G

Liu, Jun, 0H

Liu, Leon, 0G

Liu, Sam, 0G

Liu, Xuan, 1I

Lo, Fred, 1L

Lorusso, Gian Francesco, 05

Lu, Cong, 15

Lu, Junwei, 0G

Lu, Yen-Wen, 0N

Luo, Larry, 0N

Lyu, Shizhi, 15

Lyulina, Irina, 0C

Ma, Yuansheng, 0L

Maeng, Jae Yeol, 0J

Mao, Yanjie, 1K

Masaki, Kazuo, 0X

Maslow, Mark John, 04

Mastenbroek, Marcel, 09

McDermott, Steven, 08, 0J

Megens, Henry, 0C

Menchtchikov, Boris, 0C

Merten, André, 03

Minegishi, Yuji, 12

Miyamoto, Hirotaka, 10, 1J

Mizoguchi, Hakaru, 10, 1J

Mollema, Albert, 09

Morgenfeld, Bradley, 08

Mortini, Etienne, 0T

Moulin, Christophe, 0S

Nafus, Kathleen, 05

Nam, Byoung-Sub, 0K

Noell, Wilfried, 0W, 1F

Oh, Sang-Jin, 0K

Oh, SeungHwa, 0B

Oh, Se-Young, 0K, 0L

Ohta, Takeshi, 10, 1J

Opalevs, Dmitrijs, 0W, 1F

Ordonio, Christopher, 08

Ostrovsky, Alain, 0T

Padi, Alexander, 09

Park, Bono, 0A

Park, Chan-Ha, 0K, 0L

Park, Dae-Jin, 0L

Park, Daniel, 0B

Park, DeNeil, 0A

Park, Jeonghyun, 0B

Peng, Austin, 0G

Peng, Shin-Rung, 09

Peng, Victor, 0G

Poonawala, Amyn, 0M

Prins, Steve, 18

Raghunathan, Sudhar, 0C

Ray, Cédric, 0S

Rechtsteiner, Greg, 05

Reijnen, Liesbeth, 04

Rijpers, Bart, 1G

Rijpstra, Manouk, 0C

Rockstuhl, Carsten, 0W, 1F

Rodin, Sergei, 0I

Roizen, Victoria, 0I

Saito, Takashi, 10

Samudrala, Pavan, 0A

Samy, Aravind Narayana, 0F

Sasaki, Ryunosuke, 1M

Scharf, Toralf, 0W, 1F

Schelcher, Guillaume, 04

Schenk, Harald, 03

Schmitt-Weaver, Emil, 0B

Scholz, Matthias, 0W, 1F

Sczyrba, Martin, 0F

Selinidis, Kosta, 0M

Seltmann, Rolf, 0F

Seoud, Ahmed, 0K, 0L

Ser, Jung-Hoon, 0N

Shao, Feng, 0Q

Shen, Yijiang, 1C

Shi, Hongbo, 0D

Shi, Weijie, 1K

Shi, Xiaolong, 0G

Shibazaki, Yuichi, 0X

Shome, Krishanu, 0C

Shu, Jing, 18

Shu, Vincent, 0N

Smeets, Bart, 1G

Socha, Robert, 0C

Song, Zhiyang, 0G

Soppera, Olivier, 0S

Stiffler, Scott, 0D

Stobert, Ian, 0D

Su, Jing, 0N

Sun, Dezheng, 0N

Sun, Gang, 1K

Tanaka, Hiroshi, 10

Tanaka, Makoto, 1J

Teeuwisse, Floris, 09, 0C

Teshima, Yoshihiro, 0X

Thamm, Thomas, 0F

Thijssen, Theo, 09

Tijssen, Robin, 09

Timoshkov, Vadim, 04

Tritchkov, Alexander, 0I, 1H

Tsushima, Hiroaki, 10, 1J

Tzeng, Wilson, 09

Vakulov, Pavel S., 1E

van Bokhoven, Laurens, 09

van Damme, Jean Phillippe, 09

van Mierlo, Willem, 1G

Vetter, Andreas, 0W, 1F

Vinogradova, Olga A., 1E

Voelkel, Reinhard, 0W, 1F

Vos, Harald, 09

Vu, Hien T., 0R

Vu, Thuy T. T., 1G

Wagner, Michael, 03

Wang, Cathy, 09

Wang, Jun, 0G

Wang, Shibing, 0N

Wang, Xiangzhao, 1K

Wang, Yumin, 0H

Watanabe, Mizuki, 18

Wei, Yayi, 19

Word, James, 0R, 1H

Wu, Hsueh-Hung, 09

Xiao, Guangming, 0M

Xu, Gang, 0G

Yang, Andy, 0G

Yang, Elvis, 1L

Yang, Ta-Hone, 1L

Ye, Tianchun, 19

Yeromonahos, Christelle, 0S

Yoda, Yasushi, 0X

Yoon, Jebum, 0K

Yueh, Ting-Ju, 09

Yune, Hyoung-Soon, 0L

Zhang, Cuiping, 0G

Zhang, Dan, 1H

Zhang, Gary, 0N

Zhang, Jingjing, 0Q

Zhang, Lei, 1G

Zhang, Libin, 19

Zhang, Quan, 0N

Zhao, Ke, 0H

Zhao, Lijun, 19

Zheng, Chumeng, 0C

Zhou, Yue, 0A

Ziger, David, 18

Zou, Yi, 0N

Zuniga, Christian, 0Q

Conference Committee

Symposium Chair

  • Bruce W. Smith, Rochester Institute of Technology (United States)

Symposium Co-chair

  • Will Conley, Cymer, An ASML company (United States)

Conference Chair

  • Jongwook Kye, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

Conference Co-chair

  • Soichi Owa, Nikon Corporation (Japan)

Conference Program Committee

  • Will Conley, Cymer, An ASML company (United States)

  • Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

  • Carlos Fonseca, Tokyo Electron America, Inc. (United States)

  • Bernd Geh, Carl Zeiss SMT Inc. (United States)

  • Yuri Granik, Mentor Graphics Corporation (United States)

  • Harsha Grunes, Intel Corporation (United States)

  • Young Seog Kang, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Sachiko Kobayashi, Toshiba Corporation (Japan)

  • Kafai Lai, IBM Corporation (United States)

  • Kevin Lucas, Synopsys, Inc. (United States)

  • John S. Petersen, Periodic Structures, Inc. (United States)

  • Mark C. Phillips, Intel Corporation (United States)

  • Daniel Sarlette, Infineon Technologies Dresden (Germany)

  • Xuelong Shi, Shanghai Integrated Circuit Research & Development Center (China)

  • Bruce W. Smith, Rochester Institute of Technology (United States)

  • Kazuhiro Takahashi, Canon Inc. (Japan)

  • Geert Vandenberghe, IMEC (Belgium)

  • Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)

  • Da Yang, Qualcomm Inc. (United States)

  • Uwe D. Zeitner, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

Session Chairs

  • Opening Remarks

    Jongwook Kye, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

    Soichi Owa, Nikon Corporation (Japan)

  • 1 Keynote Session

    Jongwook Kye, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

    Soichi Owa, Nikon Corporation (Japan)

  • 2 Advanced Process Control I

    Geert Vandenberghe, IMEC (Belgium)

    Young Seog Kang, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • 3 Advanced Process Control II

    Sachiko Kobayashi, Toshiba Corporation (Japan)

    Soichi Owa, Nikon Corporation (Japan)

  • 4 Advanced Process Modeling

    Kafai Lai, IBM Thomas J. Watson Research Center (United States)

    Da Yang, Qualcomm Inc. (United States)

  • 5 Computational Lithography I

    Yuri Granik, Mentor Graphics Corporation (United States)

    Kevin Lucas, Synopsys, Inc. (United States)

  • 6 Pattern Correction Methods: Joint session with conferences 10588

    and 10587

    Neal V. Lafferty, Mentor, a Siemens Business (United States)

    Carlos Fonseca, Tokyo Electron America, Inc. (United States)

  • 7 Computational Lithography II

    Harsha Grunes, Intel Corporation (United States)

    Mark C. Phillips, Intel Corporation (United States)

  • 8 Non-IC Applications

    Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)

    Daniel Sarlette, Infineon Technologies Dresden (Germany)

  • 9 Toolings I

    Bernd Geh, Carl Zeiss SMT Inc. (United States)

    Kazuhiro Takahashi, Canon Inc. (Japan)

  • 10 Toolings II

    Bernd Geh, Carl Zeiss SMT Inc. (United States)

    Kazuhiro Takahashi, Canon Inc. (Japan)

© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10587", Proc. SPIE 10587, Optical Microlithography XXXI, 1058701 (14 May 2018); doi: 10.1117/12.2324760; https://doi.org/10.1117/12.2324760
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