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20 March 2018 Advances in MOEMS technologies for high quality imaging systems
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An overview of advances in MOEMS devices and technologies for high quality imaging systems is provided. A particular focus is laid on recent technological further developments possibly opening gateways to unprecedented device and system functionality by e. g.: increase of pixel count towards higher parallel operation, decrease of the mirror pitch in large arrays towards applications like high-performance holography, novel technologies for higher operation bandwidth, increase of aperture size for scanning applications like LIDAR, integration of high reflection coatings for processing of multi Watt laser radiation for marking and engraving, and phased arrays for high speed laser beam steering.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Harald Schenk, Michael Wagner, Jan Grahmann, and André Merten "Advances in MOEMS technologies for high quality imaging systems", Proc. SPIE 10587, Optical Microlithography XXXI, 1058703 (20 March 2018); doi: 10.1117/12.2297399;


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