Tunable bandwidth for application-specific SAxP process enhancement

Paolo  Alagna; Will Conley; Greg Rechtsteiner; Kathleen Nafus; Serge Biesemans; Gian Francesco Lorusso

doi:10.1117/12.2300511

20 March 2018 Tunable bandwidth for application-specific SAxP process enhancement

Paolo Alagna, Will Conley, Greg Rechtsteiner, Kathleen Nafus, Serge Biesemans, Gian Francesco Lorusso

Proceedings Volume 10587, Optical Microlithography XXXI; 1058705 (2018) https://doi.org/10.1117/12.2300511
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Use of ArFi lithography requires application-specific tuning to maximize patterning process windows. Previous investigations into the effects of light source bandwidth on imaging performance have provided the foundation for this work by identifying significant improvements in Exposure Latitude for reduced sensitivity to dose variations. This study will focus on the increase in image contrast that 200 fm light source E95 bandwidth enables on Self- Aligned Quadruple Patterning (SAQP) and Self-Aligned Double Patterning (SADP) core features. Focus of our investigation will be the understanding of roughness and profile variation through different exposure conditions.

Conference Presentation

Citation Download Citation

Paolo Alagna, Will Conley, Greg Rechtsteiner, Kathleen Nafus, Serge Biesemans, and Gian Francesco Lorusso "Tunable bandwidth for application-specific SAxP process enhancement", Proc. SPIE 10587, Optical Microlithography XXXI, 1058705 (20 March 2018); https://doi.org/10.1117/12.2300511

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