20 March 2018 Overlay control for 7nm technology node and beyond
Author Affiliations +
Abstract
We demonstrate high volume manufacturing feasibility of 7 nm technology overlay correction requirement. This stateof- the-art overlay control is achieved by (i) overlay sampling optimization and advanced modeling, (ii) alignment and advanced process control optimization, (iii) multiple target overlay optimization, and (iv) heating control. We will also discuss further improvements in overlay control for 7 nm technology node and beyond including computational metrology, extreme ultraviolet and optic tools overlay matching control, high order alignment correction, tool stability improvement, and advanced heating control.
Conference Presentation
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Nyan Aung, Nyan Aung, Woong Jae Chung, Woong Jae Chung, Pavan Samudrala, Pavan Samudrala, Haiyong Gao, Haiyong Gao, Wenle Gao, Wenle Gao, Darius Brown, Darius Brown, Guanchen He, Guanchen He, Bono Park, Bono Park, Michael Hsieh, Michael Hsieh, Xueli Hao, Xueli Hao, Yen-Jen Chen, Yen-Jen Chen, Yue Zhou, Yue Zhou, DeNeil Park, DeNeil Park, Karsten Gutjahr, Karsten Gutjahr, Ian Krumanocker, Ian Krumanocker, Kevin Jock, Kevin Jock, Juan Manuel Gomez, Juan Manuel Gomez, } "Overlay control for 7nm technology node and beyond", Proc. SPIE 10587, Optical Microlithography XXXI, 105870A (20 March 2018); doi: 10.1117/12.2295828; https://doi.org/10.1117/12.2295828
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