New open platform software for monitoring lithography process of semiconductor manufacturing

Yutaka Igarashi; Satoru Kikuchi; Levi Jordan; Kunihiko Abe; Yuji Minegishi

doi:10.1117/12.2299491

20 March 2018 New open platform software for monitoring lithography process of semiconductor manufacturing

Yutaka Igarashi, Satoru Kikuchi, Levi Jordan, Kunihiko Abe, Yuji Minegishi

Proceedings Volume 10587, Optical Microlithography XXXI; 1058712 (2018) https://doi.org/10.1117/12.2299491
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

The light source continues to play an important role in the evolution of semiconductor lithography - helping chip manufacturers to usher in their next generation nodes. Over the years, Gigaphoton has introduced innovative solutions to meet the various demands of the industry, including Injection Lock technology, active bandwidth control, and green technologies for conserving gas and electricity. Today, the needs of chip manufacturer have grown to become highly diverse and dynamic, because the set of challenges faced by each manufacturer is equally diverse and dynamic. This makes developing software solutions very challenging - as they must address a very broad scope of needs. At the same time, it is becoming increasingly important to gain a much deeper understanding of all aspects of how and to what level the light source is actively affecting each chip manufacturer’s wafer output - both in terms of yield and cost - for solutions and technologies to be effective and meaningful. However, there are many challenges to achieving this.

Citation Download Citation

Yutaka Igarashi, Satoru Kikuchi, Levi Jordan, Kunihiko Abe, and Yuji Minegishi "New open platform software for monitoring lithography process of semiconductor manufacturing", Proc. SPIE 10587, Optical Microlithography XXXI, 1058712 (20 March 2018); https://doi.org/10.1117/12.2299491

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