20 March 2018 A novel method to fast fix the post OPC weak-points through Calibre eqDRC application
Author Affiliations +
Abstract
With shrinking nodes, as the layout patterns are becoming more and more complicated, OPC accuracy and performance is becoming increasingly challenging. While we are trying to perfect our OPC script to have a clean output without weak points, in a real urgent tape-out scenario, often there will be weak points and we cannot afford the cost to run the OPC again with an updated OPC recipe. Naturally the post OPC repair becomes the only cost-effective choice. The paper studies and compares a few methods for the post OPC weak-points repair: the manual OPC repair flow and traditional repair flow based on the DRC commands. Here, we introduce a novel method based on the eqDRC commands, which are widely used in the design house but have never been used in the post OPC flow. We discuss how to apply the eqDRC into the post OPC repairs and demonstrate its advantages over the traditional methods.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
YaDong Jin, YaDong Jin, Shizhi Lyu, Shizhi Lyu, ZeXi Deng, ZeXi Deng, Cong Lu, Cong Lu, } "A novel method to fast fix the post OPC weak-points through Calibre eqDRC application", Proc. SPIE 10587, Optical Microlithography XXXI, 1058715 (20 March 2018); doi: 10.1117/12.2292695; https://doi.org/10.1117/12.2292695
PROCEEDINGS
9 PAGES


SHARE
RELATED CONTENT

Review of the 2001 ITRS update
Proceedings of SPIE (August 16 2002)
A genuine design manufacturability check for designers
Proceedings of SPIE (March 24 2006)
Mask design rules (45 nm): time for standardization
Proceedings of SPIE (November 09 2005)
Design, mask, and manufacturability
Proceedings of SPIE (December 06 2004)

Back to Top