20 March 2018 Optical design of objectives for reducing photolithography
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Abstract
This paper reviews the technical solutions for reduction optical photolithography systems based on the principle of obtaining a scaled-down object image. Dioptric reduction system design trends are discussed and applied technical solutions for building such systems are proposed. Genuine optical systems are offered which comply with the requirements mentioned above.
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Dmitry N. Frolov, Olga A. Vinogradova, Vladimir N. Frolov, Pavel S. Vakulov, "Optical design of objectives for reducing photolithography", Proc. SPIE 10587, Optical Microlithography XXXI, 105871E (20 March 2018); doi: 10.1117/12.2301026; https://doi.org/10.1117/12.2301026
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