20 March 2018 Extremely long life excimer laser technology for multi-patterning lithography
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Abstract
Multi-patterning techniques with ArF immersion lithography is expected to continue as main solution for manufacturing IC chips. The reduction of laser downtime has great impact on the productivity of chipmakers. The laser downtime is closely related to the lifetime of consumable parts of the laser. Gigaphoton developed new laser modules, chamber and LNM (Line Narrowing Module) which have longer lifetime than current one. New chamber demonstrated 1.2 times longer lifetime than current chamber. New LNM demonstrated 1.8 times longer lifetime than current LNM. These new modules will help to reduce the downtime of the laser.
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Yousuke Fujimaki, Yousuke Fujimaki, Makoto Tanaka, Makoto Tanaka, Takashi Itou, Takashi Itou, Hirotaka Miyamoto, Hirotaka Miyamoto, Miwa Igarashi, Miwa Igarashi, Hiroaki Tsushima, Hiroaki Tsushima, Takeshi Asayama, Takeshi Asayama, Takahito Kumazaki, Takahito Kumazaki, Akihiko Kurosu, Akihiko Kurosu, Takeshi Ohta, Takeshi Ohta, Satoru Bushida, Satoru Bushida, Hakaru Mizoguchi, Hakaru Mizoguchi, } "Extremely long life excimer laser technology for multi-patterning lithography", Proc. SPIE 10587, Optical Microlithography XXXI, 105871J (20 March 2018); doi: 10.1117/12.2297341; https://doi.org/10.1117/12.2297341
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