Cross-MEEF assisted SRAF print avoidance approach

Vlad Liubich; William Brown; George Lippincott; Rui Wu

doi:10.1117/12.2297227

20 March 2018 Cross-MEEF assisted SRAF print avoidance approach

Vlad Liubich, William Brown, George Lippincott, Rui Wu

Proceedings Volume 10588, Design-Process-Technology Co-optimization for Manufacturability XII; 105880T (2018) https://doi.org/10.1117/12.2297227
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Sub-resolution assist features (SRAFs) have become an integral part of low-k lithography’s resolution enhancement techniques (RET). Gradually maturing EUV technology indicates that SRAF insertion might be necessary for 5nm technology nodes and below.

In mask synthesis flows, during the correction step, an SRAF print avoidance (SPA) algorithm is relying on detection of printing predicted by model based simulation. In this paper we are presenting a cross-MEEF based SPA approach that offers elimination of SRAF printing while minimizing impact on process window.

Citation Download Citation

Vlad Liubich, William Brown, George Lippincott, and Rui Wu "Cross-MEEF assisted SRAF print avoidance approach", Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 105880T (20 March 2018); https://doi.org/10.1117/12.2297227

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