In mask synthesis flows, during the correction step, an SRAF print avoidance (SPA) algorithm is relying on detection of printing predicted by model based simulation. In this paper we are presenting a cross-MEEF based SPA approach that offers elimination of SRAF printing while minimizing impact on process window.
ACCESS THE FULL ARTICLE
Vlad Liubich, William Brown, George Lippincott, Rui Wu, "Cross-MEEF assisted SRAF print avoidance approach," Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 105880T (20 March 2018);