This paper presents a solution to compare two layouts by using Calibre DRC and Pattern Matching. The key step in this flow is layout decomposition. In theory, with a fixed pattern size, a layout can always be decomposed into limited number of patterns by moving the pattern center around the layout, the number is limited but may be huge if the layout is not processed smartly! A mathematical answer is not what we are looking for but an engineering solution is more desired. Layouts must be decomposed into patterns with physical meaning in a smart way. When a layout is decomposed and patterns are classified, a pattern library with unique patterns inside is created for that layout. After individual pattern libraries for each layout are created, run pattern comparison utility provided by Calibre Pattern Matching to compare the pattern libraries, unique patterns will come out for each layout. This paper illustrates this flow in details and demonstrates the advantage of combining Calibre DRC and Calibre Pattern Matching.
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Lucas Huang, Legender Yang, Huan Kan, Elain Zou, Qijian Wan, Chunshan Du, Xinyi Hu, Zhengfang Liu, "Using pattern based layout comparison for a quick analysis of design changes," Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 105880X (20 March 2018);