1 December 2017 Reflectance analysis of porosity gradient in nanostructured silicon layers
Author Affiliations +
Proceedings Volume 10603, Photonics, Devices, and Systems VII; 106031B (2017) https://doi.org/10.1117/12.2292723
Event: Photonics Prague 2017, 2017, Prague, Czech Republic
Abstract
In this work we study optical properties of nanostructured layers formed on silicon surface. Nanostructured layers on Si are formed in order to reach high suppression of the light reflectance. Low spectral reflectance is important for improvement of the conversion efficiency of solar cells and for other optoelectronic applications. Effective method of forming nanostructured layers with ultralow reflectance in a broad interval of wavelengths is in our approach based on metal assisted etching of Si. Si surface immersed in HF and H2O2 solution is etched in contact with the Pt mesh roller and the structure of the mesh is transferred on the etched surface. During this etching procedure the layer density evolves gradually and the spectral reflectance decreases exponentially with the depth in porous layer. We analyzed properties of the layer porosity by incorporating the porosity gradient into construction of the layer spectral reflectance theoretical model. Analyzed layer is splitted into 20 sublayers in our approach. Complex dielectric function in each sublayer is computed by using Bruggeman effective media theory and the theoretical spectral reflectance of modelled multilayer system is computed by using Abeles matrix formalism. Porosity gradient is extracted from the theoretical reflectance model optimized in comparison to the experimental values. Resulting values of the structure porosity development provide important information for optimization of the technological treatment operations.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stanislav Jurečka, Kentaro Imamura, Taketoshi Matsumoto, Hikaru Kobayashi, "Reflectance analysis of porosity gradient in nanostructured silicon layers", Proc. SPIE 10603, Photonics, Devices, and Systems VII, 106031B (1 December 2017); doi: 10.1117/12.2292723; https://doi.org/10.1117/12.2292723
PROCEEDINGS
6 PAGES


SHARE
RELATED CONTENT

Nanostructured SIS solar cells
Proceedings of SPIE (May 18 2010)
Black silicon photovoltaics
Proceedings of SPIE (May 02 2012)
Optical coatings with ultralow refractive index SiO2 films
Proceedings of SPIE (December 31 2009)
Nanostructured silicon for biomedical application
Proceedings of SPIE (March 16 2001)

Back to Top