The intense surface plasmons (SPs) can be generated by patterned metal nano-structure arrays, through coupling incident light onto the functioned metal surface, so as to construct highly constrained surface electromagnetic modes. Therefore, a localized micro-nano-field array with a highly compressed surface electron distribution, can also be shaped and even nano-focused over the surface, which will lead to a lot of special physical effects such as anti-reflection effect, and thus indicate many new potential applications in the field of nano-photonics and -optoelectronics. In this paper, several typical patterned sub-wavelength metal nano-structure arrays were designed according to the process, in which common silicon wafer was employed as the substrate material and aluminum as the metal film with different structural size and arrangement circle. In addition, by adjusting the dielectric constant of metal material appropriately, the power control effect on metallic nanostructure was simulated. The key properties such as the excitation intensity of the surface plasmons were studied by simulating the reflectivity characteristic curves and the electric field distribution of the nanostructure excited by incident infrared beams. It is found that the angle of corners, the arrangement cycle and the metal material properties of the patterned nano-structures can be utilized as key factors to control the excitation intensity of surface plasmons.