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25 July 1989 Measurement Of H And H2 Populations In-Situ In A Low-Temperature Plasma By Vacuum-Ultraviolet Laser-Absorption Spectroscopy
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Abstract
A new technique, vacuum-ultraviolet laser-absorption spectroscopy, has been developed to quantitatively determine the absolute density of H and H2 within a plasma. The technique is particularly well suited to measurement in a plasma, where high charged particle and photon backgrounds complicate other methods of detection. The high selectivity and sensitivity of the technique allows for the measurement of the rotational-vibrational state distribution of H2 as well as the translational temperature of the atoms and molecules. The technique has been used to study both pulsed and continuous IC ion-source plasma discharges. H2 state distributions in a multicusp "volume" If ion-source plasma show a high degree of internal excitation, with levels up to v = 5 and J = 8 being observed. The method is applicable for a very wide range of plasma conditions. Emission measurements from excited states of H are also reported.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. S. Schlachter, A. T. Young, G. C. Stutzin, J. W. Stearns, H. F. Dobele, K. N. Leung, and W. B. Kunkel "Measurement Of H And H2 Populations In-Situ In A Low-Temperature Plasma By Vacuum-Ultraviolet Laser-Absorption Spectroscopy", Proc. SPIE 1061, Microwave and Particle Beam Sources and Directed Energy Concepts, (25 July 1989); https://doi.org/10.1117/12.951848
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