18 January 2018 Influence of technological conditions on optical and structural properties of molybdenum oxide thin films
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Proceedings Volume 10612, Thirteenth International Conference on Correlation Optics; 1061210 (2018) https://doi.org/10.1117/12.2304772
Event: Thirteenth International Conference on Correlation Optics, 2017, Chernivtsi, Ukraine
Abstract
MoOx thin films were deposited are deposited by DC reactive magnetron sputtering at different technological conditions. Structural, electrical and optical properties of the thin films were investigated. Temperature dependences of the resistance R of the MoOx films were measured within the temperature range T ÷ 295-420 K. There was established that all samples under investigation had n-type of conductivity. Based on the dependences α2 = f(hν ), the presence of direct allowed interband optical transitions in the MoOx thin films is established and the optical band gap values are determined.
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Taras T. Kovaliuk, Taras T. Kovaliuk, Mykhailo M. Solovan, Mykhailo M. Solovan, Orest A. Parfenyuk, Orest A. Parfenyuk, Viktor V. Brus, Viktor V. Brus, Ivan P. Koziarskyi, Ivan P. Koziarskyi, Pavlo D. Maryanchuk, Pavlo D. Maryanchuk, } "Influence of technological conditions on optical and structural properties of molybdenum oxide thin films", Proc. SPIE 10612, Thirteenth International Conference on Correlation Optics, 1061210 (18 January 2018); doi: 10.1117/12.2304772; https://doi.org/10.1117/12.2304772
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