Design and fabrication of sub-wavelength anti-reflection grating

Wenlong Zou; Chaoming Li; Xinrong Chen; Zhijian Cai; Jianhong Wu

doi:10.1117/12.2292730

10 January 2018 Design and fabrication of sub-wavelength anti-reflection grating

Wenlong Zou, Chaoming Li, Xinrong Chen, Zhijian Cai, Jianhong Wu

Proceedings Volume 10616, 2017 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments; 106160Z (2018) https://doi.org/10.1117/12.2292730
Event: International Conference on Optical Instruments and Technology 2017, 2017, Beijing, China

Abstract

In the high power laser system, the reflection of optical surface has a strong impact on the efficiency for luminous energy utilization. Fresnel reflection can be effectively suppressed by antireflection film. For that, the anti-reflection film is one of the important optical elements in high power laser system. The common preparation methods of anti-reflection film include monolayer film, multilayer film and sub-wavelength grating. The effectiveness of monolayer is unsatisfactory, and its application spectrum bandwidth is very narrow. The preparation process of multilayer film is complex and it is very expensive. The emerging technology of fabrication anti-reflection film is sub-wavelength grating. The zero order transmission diffraction efficiency depends on the period, etching depth and duty cycle of the grating. The structure parameters of antireflection grating were designed and optimized under small angle incidence of 351nm based on rigorous coupled wave analysis method. The impaction of zero order reflection diffraction and zero order transmission diffraction efficiency on period, duty cycle and etching depth of grating was discussed in detail in this paper. The sub-wavelength anti-reflection grating was fabricated by holographic and ion etching method.

Citation Download Citation

Wenlong Zou, Chaoming Li, Xinrong Chen, Zhijian Cai, and Jianhong Wu "Design and fabrication of sub-wavelength anti-reflection grating", Proc. SPIE 10616, 2017 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 106160Z (10 January 2018); https://doi.org/10.1117/12.2292730

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Diffraction

Diffraction gratings

Reflection

Etching

Optical design

Holography

Photoresist materials

Show All Keywords

Keywords/Phrases

Search In:

Publication Years