10 January 2018 Design and fabrication of sub-wavelength anti-reflection grating
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Abstract
In the high power laser system, the reflection of optical surface has a strong impact on the efficiency for luminous energy utilization. Fresnel reflection can be effectively suppressed by antireflection film. For that, the anti-reflection film is one of the important optical elements in high power laser system. The common preparation methods of anti-reflection film include monolayer film, multilayer film and sub-wavelength grating. The effectiveness of monolayer is unsatisfactory, and its application spectrum bandwidth is very narrow. The preparation process of multilayer film is complex and it is very expensive. The emerging technology of fabrication anti-reflection film is sub-wavelength grating. The zero order transmission diffraction efficiency depends on the period, etching depth and duty cycle of the grating. The structure parameters of antireflection grating were designed and optimized under small angle incidence of 351nm based on rigorous coupled wave analysis method. The impaction of zero order reflection diffraction and zero order transmission diffraction efficiency on period, duty cycle and etching depth of grating was discussed in detail in this paper. The sub-wavelength anti-reflection grating was fabricated by holographic and ion etching method.
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Wenlong Zou, Wenlong Zou, Chaoming Li, Chaoming Li, Xinrong Chen, Xinrong Chen, Zhijian Cai, Zhijian Cai, Jianhong Wu, Jianhong Wu, } "Design and fabrication of sub-wavelength anti-reflection grating", Proc. SPIE 10616, 2017 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 106160Z (10 January 2018); doi: 10.1117/12.2292730; https://doi.org/10.1117/12.2292730
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