12 January 2018 Image based method for aberration measurement of lithographic tools
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Abstract
Information of lens aberration of lithographic tools is important as it directly affects the intensity distribution in the image plane. Zernike polynomials are commonly used for a mathematical description of lens aberrations. Due to the advantage of lower cost and easier implementation of tools, image based measurement techniques have been widely used. Lithographic tools are typically partially coherent systems that can be described by a bilinear model, which entails time consuming calculations and does not lend a simple and intuitive relationship between lens aberrations and the resulted images. Previous methods for retrieving lens aberrations in such partially coherent systems involve through-focus image measurements and time-consuming iterative algorithms. In this work, we propose a method for aberration measurement in lithographic tools, which only requires measuring two images of intensity distribution. Two linear formulations are derived in matrix forms that directly relate the measured images to the unknown Zernike coefficients. Consequently, an efficient non-iterative solution is obtained.
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Shuang Xu, Shuang Xu, Bo Tao, Bo Tao, Yongxing Guo, Yongxing Guo, Gongfa Li, Gongfa Li, } "Image based method for aberration measurement of lithographic tools", Proc. SPIE 10620, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology, 106200C (12 January 2018); doi: 10.1117/12.2287057; https://doi.org/10.1117/12.2287057
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