12 January 2018 Design of crossed planar phase grating for metrology
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Abstract
Crossed-grating is widely used as the standard element for metrology in two-dimensional precision positioning system. It has many advantages such as high resolution, compact structure, good environmental adaptability and less Abbe error. In this paper, the design of crossed planar reflecting phase grating used under the Littrow condition with circularly polarized light at 780nm wavelength has been carried out. The aim of the design is to find out the range of structure parameters of crossed-grating that has higher -1st order diffraction efficiency and good efficiency equilibrium for both of TE- and TM-polarized incident lights. By adoption of the Fourier modal method (FMM), the microstructure parameters of the 1200lines/mm crossed grating with the duty cycle range of 10% to 50% and the profile depth of 150nm to 350nm have been searched exactly. The calculation results show that: When the duty cycle range of the grating is 42% to 44% and profile depth is 210nm to 220nm, the -1st diffraction efficiencies of TE- and TM-polarized lights are both above 60% and the efficiency equilibrium is better than 80%.
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Yu Tang, Yu Tang, Xinrong Chen, Xinrong Chen, Chaoming Li, Chaoming Li, Rui Wang, Rui Wang, Haiyan Xu, Haiyan Xu, Yushui Cheng, Yushui Cheng, } "Design of crossed planar phase grating for metrology", Proc. SPIE 10621, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 106211D (12 January 2018); doi: 10.1117/12.2294988; https://doi.org/10.1117/12.2294988
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