Paper
12 January 2018 Removing the echoes from terahertz pulse reflection system and sample
Haishun Liu, Zhenwei Zhang, Cunlin Zhang
Author Affiliations +
Proceedings Volume 10623, 2017 International Conference on Optical Instruments and Technology: IRMMW-THz Technologies and Applications; 106230L (2018) https://doi.org/10.1117/12.2295235
Event: International Conference on Optical Instruments and Technology 2017, 2017, Beijing, China
Abstract
Due to the echoes both from terahertz (THz) pulse reflection system and sample, the THz primary pulse will be distorted. The system echoes include two types. One preceding the main peak probably is caused by ultrafast laser pulse and the other at the back of the primary pulse is caused by the Fabry-Perot (F-P) etalon effect of detector. We attempt to remove the corresponding echoes by using two kinds of deconvolution. A Si wafer of 400μm was selected as the tested sample. Firstly, the method of double Gaussian filter (DGF) decnvolution was used to remove the systematic echoes, and then another deconvolution technique was employed to eliminate the two obvious echoes of the sample. The ultimate results indicated: although the combination of two deconvolution techniques could not entirely remove the echoes of sample and system, the echoes were largely reduced.
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Haishun Liu, Zhenwei Zhang, and Cunlin Zhang "Removing the echoes from terahertz pulse reflection system and sample", Proc. SPIE 10623, 2017 International Conference on Optical Instruments and Technology: IRMMW-THz Technologies and Applications, 106230L (12 January 2018); https://doi.org/10.1117/12.2295235
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KEYWORDS
Deconvolution

Gaussian filters

Pulsed laser operation

Semiconducting wafers

Sensors

Silicon

Terahertz radiation

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