22 May 2018 Zero overlap stitching of microlens arrays with two-photon polymerisation
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When printing microlens arrays with a Nanoscribe Photonics Professional machine, the object is typically split in many smaller hexagonal or square fields, which are written with high-precision galvo-scanning mirrors (or with a piezo-stage). Displacements between these sub-fields are performed with a mechanical stage, which has a lower precision (±1μm). This results in misalignments in the XY-plane. However, also differences in the Z-plane are present due to limitations of the interface finding method. If such a stitching seam goes through a microlens, its resolving power is affected. In the present contribution, we will present an adaptive stitching algorithm that automatically places the writing blocks in such a way so as to avoid cutting through the individual microlenses completely.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Dehaeck, S. Dehaeck, B. Scheid, B. Scheid, P. Lambert, P. Lambert, } "Zero overlap stitching of microlens arrays with two-photon polymerisation", Proc. SPIE 10675, 3D Printed Optics and Additive Photonic Manufacturing, 106750B (22 May 2018); doi: 10.1117/12.2306384; https://doi.org/10.1117/12.2306384

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