Reproducibility and stability of nanoporous SiO2 thin film coatings

L. Ghazaryan; A. Szeghalmi

doi:10.1117/12.2313847

5 June 2018 Reproducibility and stability of nanoporous SiO₂ thin film coatings

L. Ghazaryan, A. Szeghalmi

Proceedings Volume 10691, Advances in Optical Thin Films VI; 1069110 (2018) https://doi.org/10.1117/12.2313847
Event: SPIE Optical Systems Design, 2018, Frankfurt, Germany

Abstract

In this study, single layer antireflection (AR) coatings have been realized using nanoporous SiO₂ thin films made by atomic layer deposition (ALD) and wet chemical etching. The run-to-run and etch-to-etch reproducibility of nanoporous coatings have been monitored nearly one year. Excellent reproducibility of the film thickness and refractive index, and accordingly of the optical function are demonstrated. Furthermore, the stability of the coatings in vacuum as well as at 200°C has been analyzed.

Citation Download Citation

L. Ghazaryan and A. Szeghalmi "Reproducibility and stability of nanoporous SiO₂ thin film coatings", Proc. SPIE 10691, Advances in Optical Thin Films VI, 1069110 (5 June 2018); https://doi.org/10.1117/12.2313847

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