Fabrication of phase diffractive optical elements by direct laser writing process in aluminum thin films

Sergey A. Fomchenkov; Alexey P. Porfirev

doi:10.1117/12.2313949

5 June 2018 Fabrication of phase diffractive optical elements by direct laser writing process in aluminum thin films

Sergey A. Fomchenkov, Alexey P. Porfirev

Proceedings Volume 10691, Advances in Optical Thin Films VI; 1069121 (2018) https://doi.org/10.1117/12.2313949
Event: SPIE Optical Systems Design, 2018, Frankfurt, Germany

Abstract

We present a novel method of forming the phase diffractive optical elements (DOEs) by direct laser writing in thin films of aluminum with the help of the circular laser writing system "CLWS-200S". The quality of the aluminum films were investigated depending on the parameters of magnetron sputtering process. Circular phase diffraction gratings of Al₂O₃ on the quartz substrate with a period of 4 μm and 50% duty cycle were fabricated for the desired wavelength of 532 nm. In the visible wavelength spectrum, Al₂O₃ has a refractive index of 1.8 which is higher than the refractive index of quartz 1.5 that provides a significant refractive index contrast. As a result, this fact reduces the requirement of high aspect ratio of the diffractive element structures in the Al₂O₃ film as compared to the structures in quartz by 20%. This method of phase diffraction optical elements forming substantially reduces the time, fabrication steps, costs of production and significantly improves the quality of the elements in comparison with traditional process.

Citation Download Citation

Sergey A. Fomchenkov and Alexey P. Porfirev "Fabrication of phase diffractive optical elements by direct laser writing process in aluminum thin films", Proc. SPIE 10691, Advances in Optical Thin Films VI, 1069121 (5 June 2018); https://doi.org/10.1117/12.2313949

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