Simulation of defect-induced scattering in multilayer coatings

Lei Zhang; Jinlong Zhang; Sven Schröder; Marcus Trost; Hongfei Jiao; Zhanshan Wang; Xinbin Cheng

doi:10.1117/12.2309956

15 June 2018 Simulation of defect-induced scattering in multilayer coatings

Lei Zhang; Jinlong Zhang; Sven Schröder; Marcus Trost; Hongfei Jiao; Zhanshan Wang; Xinbin Cheng

Author Affiliations +

Proceedings Volume 10692, Optical Fabrication, Testing, and Metrology VI; 106920E (2018) https://doi.org/10.1117/12.2309956
Event: SPIE Optical Systems Design, 2018, Frankfurt, Germany

Abstract

Defects in multilayer coatings significantly increase scattering loss and degrade the performance of the advanced laser systems like gravitational wave detection, laser gyroscope and ultraviolet laser, etc. The quantitative description of the defect-induced scattering in multilayer coatings was rarely addressed. In this work, the scattering characteristics of the nodular defects in Ta₂O₅/SiO₂ multilayer coatings for 1.064 μm wavelength was simulated using finite-difference time-domain method. First, the simulation process was given, several important steps that include structure modeling, far field calculation and far field to angular resolved scattering were presented. The scattering distributions of the nodular defects are similar to Airy diffraction pattern that is from a circular hole. The roughness-induced scattering from the coatings was calculated using first-order perturbation theory. The characteristics of the defect-induced scattering is significantly different from the roughness-induced scattering. The total scattering loss is approximately three orders of magnitude stronger than the roughness-induced scattering.

Citation Download Citation

Lei Zhang, Lei Zhang, Jinlong Zhang, Jinlong Zhang, Sven Schröder, Sven Schröder, Marcus Trost, Marcus Trost, Hongfei Jiao, Hongfei Jiao, Zhanshan Wang, Zhanshan Wang, Xinbin Cheng, Xinbin Cheng, } "Simulation of defect-induced scattering in multilayer coatings", Proc. SPIE 10692, Optical Fabrication, Testing, and Metrology VI, 106920E (15 June 2018); doi: 10.1117/12.2309956; https://doi.org/10.1117/12.2309956

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