Translator Disclaimer
12 July 2018 Probing 3M Trizact abrasive pads in the polishing and super-polishing phase of fused silica
Author Affiliations +
Abstract
The use of 3MTM TrizactTM diamond tiled abrasive pads was proven as a cost-effective pre-polishing technique. Thanks to the low subsurface damages introduced it allows to speed up the polishing phases, reducing the amount of material to be removed. Nowadays, different kind of abrasive pads are available on the market and some of these are dedicated to the last phases of the surface finishing. In this paper, we present the results obtained with 3MTM TrizactTM HookitTM Film Disc 268XA as last step of the polishing phases. The test activity has been carried out on fused silica samples prepared with initial Rq around 50 – 70 nm. In particular, we focused on the wear rate of the pads, the material removal rate and the micro-roughness evolution, in dependence of several parameters as the amount of water, pH, velocity and pressure. The removal rate depends on the status of the abrasive pad and on the polishing conditions, while the micro-roughness of the surface can be decreased well below 1nm rms on millimetre scale. Moreover, a combined process of bonnet pre-polishing followed by 3MTM TrizactTM polishing has been proven as a cost-effective solution to realize super-polished optical surfaces.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. M. Civitani, J. Hołyszko, and G. Vecchi "Probing 3M Trizact abrasive pads in the polishing and super-polishing phase of fused silica", Proc. SPIE 10706, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III, 107063K (12 July 2018); doi: 10.1117/12.2314176; https://doi.org/10.1117/12.2314176
PROCEEDINGS
11 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Impact of slurry pH on material removal rate and surface...
Proceedings of SPIE (October 15 2017)
Deformation of fused silica: nanoindentation and densification
Proceedings of SPIE (September 22 1998)
Controlling stress in sapphire optics
Proceedings of SPIE (October 31 1997)
Polishing micro-optic components for use in photonic systems
Proceedings of SPIE (October 28 2001)

Back to Top